High numerical aperture Hartmann wave front sensor for extreme ultraviolet spectral range

Li Lu; Koliyadu Jayanath C. P.; Donnelly Hannah; Alj Domenico; Delmas Olivier; Ruiz-Lopez Mabel; de la Rochefoucauld Ombeline; Dovillaire Guillaume; Fajardo Marta; Zhou Cangtao; Ruan Shuangchen; Dromey Brendan; Zepf Matt; Zeitoun Philippe

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High numerical aperture Hartmann wave front sensor for extreme ultraviolet spectral range

机译：高数孔径Hartmann波前传感器，用于极端紫外线谱

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We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyond lambda/39 root mean square (rms) at lambda = 32 nm. The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics. (C) 2020 Optical Society of America

机译：我们提出了一种新颖，据我们所知，用于极端紫外（EUV）光谱范围的Hartmann波前传感器，其数值孔径（NA）为0.15。使用基于气体高谐波产生的EUV辐射源校准传感器。校准以及仿真结果，在Lambda = 32nm处的Lambda / 39根均线（RMS）之外的精确度。传感器适用于10nm至45nm光谱系统中的波正面测量。该紧凑型波浪前传感器高真空兼容，为原位运行设计，允许广泛的应用最新EUV源或高NA EUV光学器件。（c）2020美国光学学会

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来源
《Optics Letters》 |2020年第15期|共4页
作者
Li Lu; Koliyadu Jayanath C. P.; Donnelly Hannah; Alj Domenico; Delmas Olivier; Ruiz-Lopez Mabel; de la Rochefoucauld Ombeline; Dovillaire Guillaume; Fajardo Marta; Zhou Cangtao; Ruan Shuangchen; Dromey Brendan; Zepf Matt; Zeitoun Philippe;
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作者单位

Shenzhen Technol Univ Ctr Adv Mat Diagnost Technol Shenzhen 518118 Peoples R China;

Ecole Polytech IP Paris Lab Opt Appl ENSTA ParisTech CNRS UMR 7639 Palaiseau France;

Queens Univ Belfast Ctr Plasma Phys Sch Math &

Phys Belfast BT7 1NN Antrim North Ireland;

Ecole Polytech IP Paris Lab Opt Appl ENSTA ParisTech CNRS UMR 7639 Palaiseau France;

Ecole Polytech IP Paris Lab Opt Appl ENSTA ParisTech CNRS UMR 7639 Palaiseau France;

DESY D-22607 Hamburg Germany;

Imagine Opt 18 Rue Charles de Gaulle F-91400 Orsay France;

Imagine Opt 18 Rue Charles de Gaulle F-91400 Orsay France;

Inst Super Tecn Grp Lasers &

Plasmas Inst Plasmas &

Fusao Nucl P-1049001 Lisbon Portugal;

Shenzhen Technol Univ Ctr Adv Mat Diagnost Technol Shenzhen 518118 Peoples R China;

Shenzhen Technol Univ Ctr Adv Mat Diagnost Technol Shenzhen 518118 Peoples R China;

Queens Univ Belfast Ctr Plasma Phys Sch Math &

Phys Belfast BT7 1NN Antrim North Ireland;

Helmholtz Inst Jena Frobelstieg 3 D-07743 Jena Germany;

Ecole Polytech IP Paris Lab Opt Appl ENSTA ParisTech CNRS UMR 7639 Palaiseau France;

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正文语种 eng
中图分类计量学;光学;
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专利

1. High numerical aperture Hartmann wave front sensor for extreme ultraviolet spectral range [J] . Li Lu, Koliyadu Jayanath C. P., Donnelly Hannah, Optics Letters . 2020,第15期

机译：高数孔径Hartmann波前传感器，用于极端紫外线谱
2. Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: analysis and limitations [J] . Priya Dwivedi, Silvania F. Pereira, H. Paul Urbach Optical engineering . 2019,第4期

机译：Ptychography作为高数值孔径极紫外光刻的波前传感器：分析和局限性
3. Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: analysis and limitations [J] . Priya Dwivedi, Silvania F. Pereira, H. Paul Urbach Optical engineering . 2019,第4期

机译：PTychography作为高数孔径极端紫外线光刻的波前传感器：分析和限制
4. A device based on the Shack-Hartmann Wave Front sensor for testing wide aperture optics [C] . Alexander Nikitin, Julia Sheldakova, Alexis Kudryashov, Photonic Instrumentation Engineering III . 2016

机译：基于Shack-Hartmann Wave Front传感器的设备，用于测试宽孔径光学器件
5. Closed Loop Tip-Tilt Correction for a Pyramid-Shack-Hartmann Hybrid Wave-Front Sensor [D] . Jean, Madison. 2021

机译：金字塔棚哈茨曼混合波前传感器的闭环尖端倾斜校正
6. Three-dimensional surface profiling and optical characterization of liquid microlens using a Shack–Hartmann wave front sensor [O] . Chenhui Li, Gunnsteinn Hall, Xuefeng Zeng, -1

机译：使用Shack-Hartmann波前传感器对液体微透镜进行三维表面轮廓分析和光学表征
7. Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: analysis and limitations [O] . Priya Dwivedi, Silvania F. Pereira, H. Paul Urbach 2019

机译：PTychography作为高数孔径极端紫外线光刻的波前传感器：分析和限制

High numerical aperture Hartmann wave front sensor for extreme ultraviolet spectral range

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