机译:通过太赫兹光谱测量的单层MOS2中的基板诱导的电子定位
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Chinese Acad Sci Suzhou Inst Nanotech &
Nanobion Key Lab Nanodevices &
Applicat Suzhou 215123 Peoples R China;
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Chinese Acad Sci Inst Solid State Phys Key Lab Mat Phys Hefei 230031 Anhui Peoples R China;
Yunnan Univ Sch Phys &
Astron Kunming 650091 Yunnan Peoples R China;
China Acad Engn Phys Inst Appl Elect Mianyang 621900 Sichuan Peoples R China;
China Acad Engn Phys Inst Appl Elect Mianyang 621900 Sichuan Peoples R China;
China Acad Engn Phys Inst Appl Elect Mianyang 621900 Sichuan Peoples R China;
机译:通过太赫兹光谱测量的单层MOS2中的基板诱导的电子定位
机译:DFT技术对块状MoS2及其单层电子性能的比较研究:机械应变在MoS2单层上的应用
机译:基质诱导的局部应变在单层MoS2中的间接带隙水坑
机译:通过太赫兹时域光谱测量的单层MOS2的透射率和纸张电导率
机译:衬底诱导的CVD生长的MoS2薄膜的效应研究
机译:太赫兹时域光谱法测量不同衬底上单层六方氮化硼的光电性能
机译:通过Terahertz时域光谱测量的不同基材上单层六方氮化物的光电性能