Effects of film thickness on the linear and nonlinear refractive index of <ce:italic>p</ce:italic>-type SnO films deposited by e-beam evaporation process

Y.A. El-Gendy

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Effects of film thickness on the linear and nonlinear refractive index of p-type SnO films deposited by e-beam evaporation process

机译：薄膜厚度对 P 展开▼

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Abstract

Tin monoxide (SnO) films of different thickness have been deposited onto glass substrates at vacuum pressure of ～ 8 × 10?6mbar using an e-beam evaporation system. A hot probe test revealed that the deposited films showedp-type conduction. The structure characterization and phase purity of the deposited films was confirmed using X-ray diffraction (XRD) and Raman spectroscopy. The optical transmission and reflection spectra of the deposited films recorded in the wavelength range 190–2500nm were used to calculate the optical constants employing the Murmann's exact equations. The refractive index dispersion was adequately described by the well-known effective-single-oscillator model proposed by Wemple–DiDomenico, whereby the dispersion parameters were calculated. The nonlinear refractive index and nonlinear optical susceptibility of the deposited films were successfully evaluated using the Miller empirical relations. The lattice dielectric constant and the carrier concentration to the effective mass ratio were also calculated as a function of film thickness using the Spitzer and Fan model. The variation of the optical band gap of the deposited films as a function of film thickness was also presented.

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机译：<！[cdata [ 抽象

锡一氧化物（SNO）薄膜的不同厚度沉积在真空压力下的玻璃基板上，在〜8×10 ？6 mbar使用电子束蒸发系统。热探测试验显示沉积的薄膜显示 p - 型传导。使用X射线衍射（XRD）和拉曼光谱证实沉积膜的结构表征和相纯度。在190-2500nm的波长范围内记录的沉积膜的光学传输和反射光谱用于计算采用MURMANN的确切方程的光学常数。通过Wemple-Didomenico提出的众所周知的有效单振荡器模型充分描述了折射率分散体，从而计算了分散参数。使用米勒经验关系成功评估沉积膜的非线性折射率和非线性光学敏感性。还使用Spitzz和风扇模型作为膜厚度的函数计算晶格介电常数和载流子浓度。还提出了作为膜厚度函数的沉积膜的光带间隙的变化。 ]]>

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《Physica, B. Condensed Matter》 |2017年第2017期|共5页
作者
Y.A. El-Gendy;
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作者单位

Physics Department Helwan University;

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原文格式 PDF
正文语种 eng
中图分类物理学;
关键词
Transparent conducting oxides; SnO thin film; Film thickness; Linear and nonlinear refractive index; Optical band gap;

机译：透明导电氧化物;SNO薄膜;膜厚度;线性和非线性折射率;光带隙;

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Effects of film thickness on the linear and nonlinear refractive index of p-type SnO films deposited by e-beam evaporation process

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