Understanding plasma sources

A. Ganguli; R. D. Tarey

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Understanding plasma sources

机译：了解等离子体源

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The paper discusses the basic physical mechanisms behind different plasma discharges. An attempt is made to integrate the analysis by considering the salient changes brought about in discharge formation and plasma behaviour, as the frequency of the applied power is raised from dc to microwave frequencies. Following this, discharge systems commonly used in plasma sources are examined and discussed. These include the capacitively and inductively coupled rf discharges, helicon discharges, the microwave, electron cyclotron resonance and surface wave discharges.

机译：本文讨论了不同等离子体放电背后的基本物理机制。尝试通过将施加功率的频率从直流频率提高到微波频率来考虑放电形成和等离子体行为引起的显着变化来整合分析。此后，对等离子体源中常用的放电系统进行了检查和讨论。这些包括电容和电感耦合的射频放电，螺旋放电，微波，电子回旋共振和表面波放电。

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《Current Science: A Fortnightly Journal of Research》 |2002年第3期|共12页
作者
A. Ganguli; R. D. Tarey;
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原文格式 PDF
正文语种 eng
中图分类自然科学现状及发展;
关键词
plasma sources; physical mechanisms; discharge systems;

机译：等离子体源;物理机制;放电系统;

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