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Atomic Layer Deposition of Titania in Ordered Mesoporous Cerium Zirconium Oxide Thin Films: A Case Study

机译:钛菊锆锆氧化锆薄膜原子层沉积:一个案例研究

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摘要

A strategy is presented to deposit defined layers of TiO2 onto the pore surface within ordered mesoporous, crystalline CeO2-ZrO2 thin films using atomic layer deposition (ALD). As structure-directing agent, a special diblock copolymer, poly(isobutylene)-block-poly-(ethylene oxide), was used, resulting in a three-dimensional arrangement of spherical pores with diameter around 13 nm. High resolution transmission electron microscopy investigations evidence the presence of anatase TiO2 coatings within the mesopores, while ellipsometric porosimetry studies together with time-of-flight secondary-ion mass spectrometry depth profiles indicate the deposition inside the mesopores up to 50 ALD cycles. Afterward, the interconnecting channels between the mesopores are filled completely prohibiting further transport of the gaseous TiO2 precursor into the ordered structure of mesopores and hence, limit the layer growth on the surfaces of the pores. Therefore, the size of the mesopores and their connections are decisive when growing transition-metal oxide layers on the surface of porous substrates and need to be considered for future depositions using ALD. The hybrid TiO2/CeO2-ZrO2 materials are studied by several complementary analytical techniques, to validate the deposition process and also the applicability of these techniques for such materials in general.
机译:提出一种策略以将定义的TiO 2层沉积在有序的介孔中,结晶CeO 2-ZrO2薄膜(ALD)内的有序的介孔。作为结构引导剂,使用特殊二嵌段共聚物,聚(异丁烯) - 伯 - 伯 - (环氧乙烷),导致直径约为13nm的球形孔的三维排列。高分辨率透射电子显微镜研究证据证据证据证据表明在中孔内的锐钛矿TiO2涂层,而椭百分子测量孔隙测定法与飞行时间二次离子质谱分析深度剖面表明在中孔内的沉积,最高可达50 ALD循环。之后,将中孔之间的互连通道完全允许进一步禁止将气态TiO2前体的进一步传送到中孔的有序结构中,因此限制孔表面上的层生长。因此,当在多孔基板表面上生长过渡 - 金属氧化物层时,中孔的大小和它们的连接是果断的,并且需要考虑使用ALD的未来沉积。通过几种互补的分析技术研究了杂交TiO2 / CeO2-ZrO2材料,以验证沉积工艺以及这些技术的应用通常。

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