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首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Deoxofluorination of graphite oxide with sulfur tetrafluoride
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Deoxofluorination of graphite oxide with sulfur tetrafluoride

机译：石墨氧化物与四氟化硫脱氧氟化

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摘要

In this study, deoxofluorination of graphite oxide (GO) using sulfur tetrafluoride (SF4) at a temperature below the decomposition temperature of GO (similar to 200 degrees C) was investigated for the first time with and without HF catalysis. At 25 degrees C, the reaction proceeds only at high SF4 pressures (>= 8 atm) when not catalyzed by HF and at 1 atm SF4 under the catalysis of HF. The degree of fluorination increases at higher temperatures and SF4 pressures. Hydroxy and carbonyl groups are replaced by fluorine following this reaction, and SF4 and SOF2 are introduced into the product, while the epoxy groups do not react. SF4 and SOF2 in the products are removed by washing with water. The obtained product is less hygroscopic than pristine GO owing to the hydrophobicity of the fluorine atom. The interlayer separation of the product is increased after deoxofluorination despite the smaller size of fluorine than the sizes of the oxygen-containing functional groups. When compared with direct fluorination using elemental fluorine, deoxofluorination using SF4 has the advantages of high reactivity with hydroxy groups and the preservation of the carbon skeleton, and the reaction results in the formation of graphite oxyfluoride.
机译：在该研究中，首次使用和不含HF催化，在低于去（类似于200摄氏度）的温度下使用硫四氟化物（SF4）的石墨氧化物（SF4）的脱氧氟化物。在25摄氏度下，当在HF的催化下不被HF和1atm SF4催化时，反应在高SF4压力（> = 8atm）下进行。氟化程度在较高温度和SF4压力下增加。通过在该反应后通过氟代替羟基和羰基，将SF4和SOF2引入产品中，而环氧基团不会反应。通过用水洗涤除去产品中的SF4和SOF2。由于氟原子的疏水性，所得产物比原始流动较小。脱氧氟化后，产物的层间分离尽管氟的含量小于含氧官能团的尺寸。与使用元素氟的直接氟化相比，使用SF4的脱氧氟化具有高反应性与羟基的优点，并保存碳骨架，反应导致石墨氧化石墨的形成。

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