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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Effects of the emission layer structure on the electroluminescence performance of the white organic light emitting diodes based on thermally activated delayed fluorescence emitters
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Effects of the emission layer structure on the electroluminescence performance of the white organic light emitting diodes based on thermally activated delayed fluorescence emitters

机译:发光层结构对基于热活化延迟荧光发射器的白色有机发光二极管电致发光性能的影响

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摘要

White organic light emitting diodes (WOLED) employing blue, green and red thermally activated delayed fluorescence (TADF) emitters of DMAC-DPS(B), 4CzIPN(G) and 4CzTPN-Ph(R) and various emission layer (EML) structures of G/B, G/R/B and R:G(4CzTPN-Ph(R) doped in 4CzIPN(G) host)/B are fabricated and the effects of the EML structure, including EML thickness and 4CzTPN-Ph(R) dopant concentration, on the electroluminescence (EL) performance are investigated. It is found that the WOLED with the simple EML structure of G(20 nm)/B(10 nm) demonstrates maximum power efficiency (PE) around 16 lm/w and color rendering index (CRI) of 81. Meanwhile, R:G/B EML exhibits better EL performance than that of G/R/B EML. Especially, striking high CRI of 90 together with maximum PE around 13 lm/w can be obtained for R(1 wt%):G(20 nm)/B(10 nm) EML by meticulously modulation of EML thickness and 4CzTPN-Ph(R) dopant concentration, indicating the achievement of balance between EL efficiency and CRI for non-doped TADF emitter-based WOLED. Furthermore, the stacked EML of G(20 nm)/R(0.1 nm) and G(20 nm)/R( 0.1 nm)/B(10 nm) reveal much more serious obstruction of delayed fluorescence (DF) compared to mixed EML of R(1 wt%):G(20 nm) and R(1 wt%):G(20 nm)/B(10 nm), implying more intensified quenching effects from the sandwiched 0.1 nm 4CzTPN-Ph(R) layer which will lead to deterioration of EL performance. Different energy transfer routes are derived based on the transient photoluminescence decaying dynamics of R(1 wt%):G(20 nm)/B(10 nm) and G(20 nm)/R(0.1 nm)/B(10 nm) EML and the sandwiched 4CzTPN-Ph(R) ultrathin layer is found to be critical. The decaying dynamics responsible for such EML structure dependent EL performance is discussed in detail.
机译:使用蓝色,绿色和红色热激活的延迟荧光(TADF)发光二极管(TADF)发射DMAC-DPS(B),4CzIPN(G)和4CzTPN-pH(R)和各种发射层(EML)结构的白色有机发光二极管(TADF)。 G / B,G / R / B和R:g(4CzTPN-pH(R)掺杂在4Czipn(g)宿主中)/ b的效果,并包括EML厚度和4cztpn-ph(r)的效果研究了掺杂剂浓度,对电致发光(EL)性能进行了研究。结果发现,具有G(20nm)/ b(10nm)的简单EM1结构的Woled展示了大约16 lm / w的最大功率效率(PE)和81的颜色渲染指数(CRI)。同时,R:G / B EML表现出比G / R / B EML的更好的EL性能。特别地,通过精体地调节EML厚度和4CzTPN-pH(4czTPN-pH(4cztpn-pH),可以获得R(1wt%):g(20nm)/b(10nm)EML的缩小90的高CRI。 R)掺杂剂浓度,表明EL效率与CRI之间的平衡,用于非掺杂TADF发射器的磨损。此外,与混合EML相比,G(20nm)/ r(0.1nm)和g(20nm)/ r(0.1nm)/ r(0.1nm)/ b(10nm)的堆叠的em1揭示了延迟荧光(df)的更严重阻塞R(1wt%):g(20nm)和r(1wt%):g(20nm)/ b(10nm),暗示从夹心0.1nm 4cztpn-pH(R)层中的更强烈的猝灭效应这将导致EL性能恶化。基于R(1wt%):g(20nm)/ b(10nm)和g(20nm)/ r(0.1nm)/ b(10nm)(10nm)的瞬态光致发光衰减动态来衍生不同的能量转移途径EML和夹层的4CzTPN-pH(R)超薄层是至关重要的。详细讨论了负责这种EML结构依赖性EL性能的衰减动力学。

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