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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Superconducting FeSe0.1Te0.9 thin films integrated on Si-based substrates
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Superconducting FeSe0.1Te0.9 thin films integrated on Si-based substrates

机译:超导FESE0.1TE0.9集成在基于SI基底的薄膜

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摘要

With the goal of integrating superconducting iron chalcogenides with Si-based electronics, superconducting FeSe0.1Te0.9 thin films were directly deposited on Si and SiOx/Si substrates without any buffer layer by a pulsed laser deposition (PLD) method. Microstructural characterization showed excellent film quality with mostly c-axis growth on both types of substrates. Superconducting properties (such as superconducting transition temperature T-c and upper critical field H-c2) were measured to be comparable to that of the films on single crystal oxide substrates. The work demonstrates the feasibility of integrating superconducting iron chalcogenide (FeSe0.1Te0.9) thin films with Si-based microelectronics.
机译:通过将超导铁硫属元素与Si基电子器件集成的目的,超导Fese0.1te0.9薄膜通过脉冲激光沉积(PLD)方法直接沉积在Si和SiOx / Si基板上而没有任何缓冲层。 微观结构表征显示出优异的薄膜质量,主要是两种类型的基材上的C轴生长。 测量超导性质(例如超导转变温度T-C和上临界场H-C2)以与单晶氧化物基材上的膜的薄膜相当。 该工作证明了将超导铁硫属化物(Fese0.1te0.9)薄膜与基于Si基微电子集成的可行性。

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