Tuning the bandgap of graphene quantum dots by gold nanoparticle-assisted O-2 plasma etching

Li Zibo; Li Zhengshun; Wu Yutong; Nan Jingjie; Wang Haiyu; Zhang Xun; Zhang Junhu; Yang Bai

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Tuning the bandgap of graphene quantum dots by gold nanoparticle-assisted O-2 plasma etching

机译：通过金纳米颗粒辅助O-2等离子体蚀刻调节石墨烯量子点的带隙

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In this article, we report a feasible etching method to tune the bandgap of graphene quantum dots (GQDs). Since the bandgap in fluorescent carbon materials is dependent on the GQDs' size and chemical composition, GQDs with different sizes have been fabricated using the corresponding gold nanoparticle arrays as etching masks. During the O-2 etching process, the diameter of the GQDs decreased gradually accompanied by an increase in oxygen ratio. Femtosecond broadband transient absorption (TA) spectroscopy was used to investigate the variation trend in the bandgap of the GQDs. The present work affords an efficient route to investigate the photoluminescence (PL) mechanism of GQDs by tuning the size and surface chemical groups.

机译：在本文中，我们报告了一种可行的蚀刻方法来调整石墨烯量子点（GQD）的带隙。由于荧光碳材料中的带隙取决于GQDS的尺寸和化学成分，因此使用相应的金纳米颗粒阵列作为蚀刻掩模，已经制造具有不同尺寸的GQD。在O-2蚀刻工艺期间，GQD的直径逐渐降低递增氧比率。 FemtOSecond宽带瞬态吸收（TA）光谱学用于研究GQDS的带隙中的变化趋势。本作者通过调整尺寸和表面化学基团来研究GQD的光致发光（PL）机制。

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来源
《RSC Advances》 |2016年第100期|共8页
作者
Li Zibo; Li Zhengshun; Wu Yutong; Nan Jingjie; Wang Haiyu; Zhang Xun; Zhang Junhu; Yang Bai;
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作者单位

Jilin Univ Coll Chem State Key Lab Supramol Struct &

Mat Changchun Peoples R China;

Jilin Univ Coll Elect Sci &

Engn State Key Lab Integrated Optoelect 2699 Qianjin St Changchun 130012 Peoples R China;

Jilin Univ Coll Chem State Key Lab Supramol Struct &

Mat Changchun Peoples R China;

Jilin Univ Coll Chem State Key Lab Supramol Struct &

Mat Changchun Peoples R China;

Jilin Univ Coll Elect Sci &

Engn State Key Lab Integrated Optoelect 2699 Qianjin St Changchun 130012 Peoples R China;

Jilin Entry Exit Inspect &

Quarantine Bur 1301 Puyang St Changchun Peoples R China;

Jilin Univ Coll Chem State Key Lab Supramol Struct &

Mat Changchun Peoples R China;

Jilin Univ Coll Chem State Key Lab Supramol Struct &

Mat Changchun Peoples R China;

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正文语种 eng
中图分类化学;
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1. Tuning the bandgap of graphene quantum dots by gold nanoparticle-assisted O-2 plasma etching [J] . Li Zibo, Li Zhengshun, Wu Yutong, RSC Advances . 2016,第100期

机译：通过金纳米颗粒辅助O-2等离子体蚀刻调节石墨烯量子点的带隙
2. From one electron to one hole: Quasiparticle counting in graphene quantum dots determined by electrochemical and plasma etching [J] . Neubeck S., Ponomarenko L.A., Freitag F., Small . 2010,第14期

机译：从一个电子到一个空穴：通过电化学和等离子体蚀刻确定的石墨烯量子点中的准粒子计数
3. Microplasma-Enabled Graphene Quantum Dot-Wrapped Gold Nanoparticles with Synergistic Enhancement for Broad Band Photodetection [J] . Thakur Mukesh Kumar, Fang Chih-Yi, Yang Yung-Ta, ACS applied materials & interfaces . 2020,第25期

机译：使微量血巧的石墨烯量子点缠绕的金纳米颗粒，具有协同增强的宽带光电探测
4. Synthesis of Colloidal Nitrogen-Doped Graphene Quantum Dots with Tunable Bandgaps Using Atmospheric Pressure Microplasmas [C] . Darwin Kurniawan, Wei-Hung Chiang Meeting of the Electrochemical Society;International Meeting on Chemical Sensors . 2020

机译：用大气压微相的可调谐带凝胶胶体氮掺杂石墨烯量子点的合成
5. High density plasma etching of wide bandgap semiconductor materials for fabricating novel devices. [D] . Khan, Farid Ahmed. 2004

机译：用于制造新型器件的宽带隙半导体材料的高密度等离子体蚀刻。
6. Tuning inter-dot tunnel coupling of an etched graphene double quantum dot by adjacent metal gates [O] . Da Wei, Hai-Ou Li, Gang Cao, -1

机译：通过相邻金属栅极调整蚀刻的石墨烯双量子点的点间隧道耦合
7. Quasi-Continuously Tuning the Size of Graphene Quantum Dots via an Edge-Etching Mechanism [O] . Wang Shujun, Cole Ivan S., Zhao Dongyuan, 2016

机译：通过边缘刻蚀机制准连续地调整石墨烯量子点的大小

Tuning the bandgap of graphene quantum dots by gold nanoparticle-assisted O-2 plasma etching

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