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Preparation and characterization of photoactive antimicrobial graphitic carbon nitride (g-C3N4) films

机译：光活性抗微生物石墨氮化物（G-C3N4）膜的制备及表征

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摘要

Photoactive films derived from nanostructured samples of metal-free, intermediate band gap semiconductor graphitic carbon nitride (ns-g-C3N4) have been synthesized and characterized for their particle properties and antimicrobial activity. Physical characterization reveals that these materials are composed of discrete nanoparticles whose dimensions range from 200 nm to 700 nm. Investigation of the photochemical reactivity of ns-g-C3N4 using coumarin-3-carboxylic acid (3-CCA) indicates that this material produces reactive oxygen species (ROS) under visible radiation. When irradiated with 0.31 J visible light, ns-g-C3N4-based materials reduced the viability of both Gram-negative Escherichia coli O157:H7 and Gram-positive Staphylococcus aureus by approximately 50%. Nearly complete inactivation of both strains of microorganisms was achieved upon administration of a 0.62 J dose of visible radiation. Importantly, no biocidal activity was observed for non-irradiated samples, indicating that the g-C3N4-derived films are not inherently toxic in the absence of visible light. The results of this study suggest that materials and, by extention, films and coatings derived from g-C3N4 may present a novel route for controlling pathogenic microorganisms on surfaces in the environment, and could be useful in reducing incidents of hospital-acquired infections.
机译：从不含金属的，中间带隙半导体石墨氮化碳（NS-G-C3N4）纳米结构的样本导出的光敏膜已被合成并表征为它们的颗粒性能和抗微生物活性。物理表征揭示了这些材料由离散的纳米颗粒，其尺寸范围从200纳米至700纳米。使用香豆素-3-羧酸（3- CCA）NS-G-C3N4的光化学反应性的调查表明，该材料产生下可见辐射反应性氧物种（ROS）。约50％H7和革兰氏阳性金黄色葡萄球菌：当与0.31Ĵ可见光照射时，基于NS-克C3N4材料减少革兰氏阴性大肠杆菌O157的生存能力。微生物的两种菌株的几乎完全的失活在可见光辐射的0.62Ĵ剂量给药来实现。重要的是，观察到非辐照样品没有杀生物活性，这表明G-C3N4衍生薄膜不会在不存在可见光的固有毒性。这项研究的结果表明，原料和，通过从G-C3N4衍生extention，薄膜和涂层可以呈现为在环境中的表面控制病原微生物的新的途径，并且可以是在减少医院获得性感染的事件是有用的。

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  • 来源
    《RSC Advances》 |2016年第48期|共9页
  • 作者

    Thurston John H.; Hunter Necia M.; Cornell Kenneth A.;

  • 作者单位

    Coll Idaho Dept Chem 2112 Cleveland Blvd Caldwell ID 83605 USA;

    Coll Idaho Dept Chem 2112 Cleveland Blvd Caldwell ID 83605 USA;

    Boise State Univ Dept Chem &

    Biochem Boise ID 83725 USA;

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  • 正文语种 eng
  • 中图分类 化学;
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