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Detection of a high photoresponse at zero bias from a highly conducting ZnO:Ga based UV photodetector

机译:从高导电ZnO:GA基于UV光电探测器的零偏压处检测高光响应

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摘要

Ga-doped ZnO (GZO) based ultraviolet photodetectors (PDs) were fabricated by dual ion beam sputtering with a metal-semiconductor-metal structure. The room-temperature operable PD demonstrated responsivity of 58 mA W-1 at zero bias, which is 15 times larger than that reported on similar material grown by a different physical vapour deposition process, with internal and external quantum efficiency values of similar to 22.5% and 37.4%. The unbiased photodetection is attributed to the tunnelling of electrons due to heavy doping of GZO and built-in electric field due to different barriers at the two metal semiconductor contacts. The asymmetry in the electrodes was investigated by temperature-dependent current-voltage measurements.
机译:通过使用金属半导体 - 金属结构的双离子束溅射制造基于Ga掺杂的ZnO(GZO)的紫外光探测器(PDS)。 室温可操作的PD在零偏压下响应58mA W-1的响应度,比不同物理气相沉积工艺产生的类似材料的15倍,内部和外部量子效率值类似于22.5% 和37.4%。 由于两个金属半导体触点处的不同屏障,所以非偏见的光电检测归因于由于GZO的重掺杂和内置电场的隧道。 通过依赖于温度相关的电流测量来研究电极中的不对称性。

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  • 来源
    《RSC Advances》 |2015年第104期|共7页
  • 作者单位

    Indian Inst Technol Hybrid Nanodevice Res Grp HNRG Indore 453446 Madhya Pradesh India;

    Indian Inst Technol Hybrid Nanodevice Res Grp HNRG Indore 453446 Madhya Pradesh India;

    Indian Inst Technol Hybrid Nanodevice Res Grp HNRG Indore 453446 Madhya Pradesh India;

    Indian Inst Technol Dept Elect Engn Bombay 400076 Maharashtra India;

    Indian Inst Technol Hybrid Nanodevice Res Grp HNRG Indore 453446 Madhya Pradesh India;

    Indian Inst Technol Hybrid Nanodevice Res Grp HNRG Indore 453446 Madhya Pradesh India;

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  • 正文语种 eng
  • 中图分类 化学;
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