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Nanoscale surface conductivity analysis of plasma sputtered carbon thin films

机译:等级溅射碳薄膜纳米级表面电导分析

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摘要

Understanding of surface conductivity at the nanoscale is very important for surface activities e.g. bioactivity and electronic transportations. In this work, the co-relation of surface properties to surface conductivity has been investigated in carbon films prepared by plasma sputtering. A Field Emission Scanning Electron Microscopy (FE-SEM) study provided evidence of film growth in the form of the nano-domains (NDs). Conductive atomic force microscopy (C-AFM) was used to explore the influence of growth conditions on the local current flow in carbon thin films through the induced current variation across the NDs. It is found that the growth regime of the NDs has a close relation to the power density and the working pressure. The flow of current across the internal area of the ND surface is lower than the boundaries due to the difference of conjugation in sp(2) hybridized carbon atoms. The mean current flow through the films as measured by C-AFM is in accordance with the resistivity of the films observed by the van der Pauw method.
机译:对纳米级表面电导率的理解对于表面活动非常重要。生物活性和电子运输。在这项工作中,已经研究了通过等离子体溅射制备的碳膜的表面电导率与表面电导率的共同关系。场发射扫描电子显微镜(Fe-SEM)研究提供了纳米域(NDS)形式的膜生长的证据。导电原子力显微镜(C-AFM)用于探讨通过在NDS上的诱导电流变化的碳薄膜中碳薄膜中局部电流流动的影响。发现NDS的生长制度与功率密度和工作压力有密切关系。由于SP(2)杂交的碳原子中的缀合物的差异,Nd表面的内部区域的电流流量低于边界。通过C-AFM测量的薄膜的平均电流根据VAN der Pauw方法观察到的薄膜的电阻率。

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  • 来源
    《RSC Advances》 |2015年第117期|共6页
  • 作者单位

    Sungkyunkwan Univ Ctr Adv Plasma Surface Technol CAPST NU SKKU Joint Inst Plasma Nanomat IPNM Adv Mat Sci &

    Engn Suwon 440746 South Korea;

    Sungkyunkwan Univ Ctr Adv Plasma Surface Technol CAPST NU SKKU Joint Inst Plasma Nanomat IPNM Adv Mat Sci &

    Engn Suwon 440746 South Korea;

    Sungkyunkwan Univ Ctr Adv Plasma Surface Technol CAPST NU SKKU Joint Inst Plasma Nanomat IPNM Adv Mat Sci &

    Engn Suwon 440746 South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
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