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Tryptophan oxidation catabolite, N-formylkynurenine, in photo degraded cell culture medium results in reduced cell culture performance

机译:色氨酸氧化分子蛋白,N-甲酰脲素,在光降解细胞培养基中导致细胞培养性能降低

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Chemically defined media have been widely used in the biopharmaceutical industry to enhance cell culture productivities and ensure process robustness. These media, which are quite complex, often contain a mixture of many components such as vitamins, amino acids, metals and other chemicals. Some of these components are known to be sensitive to various stress factors including photodegradation. Previous work has shown that small changes in impurity concentrations induced by these potential stresses can have a large impact on the cell culture process including growth and product quality attributes. Furthermore, it has been shown to be difficult to detect these modifications analytically due to the complexity of the cell culture media and the trace level of the degradant products. Here, we describe work performed to identify the specific chemical(s) in photodegraded medium that affect cell culture performance. First, we developed a model system capable of detecting changes in cell culture performance. Second, we used these data and applied an LC-MS analytical technique to characterize the cell culture media and identify degradant products which affect cell culture performance. Riboflavin limitation and N-formylkynurenine (NFK), a tryptophan oxidation catabolite, were identified as chemicals which results in a reduction in cell culture performance. (c) 2015 American Institute of Chemical Engineers Biotechnol. Prog., 32:74-82, 2016
机译:化学定义的培养基已广泛用于生物制药工业中,以增强细胞培养生产力并确保流程鲁棒性。这些培养基非常复杂,通常含有许多组分如维生素,氨基酸,金属和其他化学物质的混合物。已知一些这些组分对包括光降解的各种应力因子敏感。以前的作品表明,这些潜在应力诱导的杂质浓度的小变化可能对细胞培养方法产生很大的影响,包括生长和产品质量属性。此外,由于细胞培养基的复杂性和降解产物的痕量水平,已经证明难以分析地检测这些修饰。在这里,我们描述了在影响细胞培养性能的光降解培养基中识别特定化学物质的工作。首先,我们开发了一种能够检测细胞培养性能变化的模型系统。其次,我们使用这些数据并应用了LC-MS分析技术来表征细胞培养基并鉴定影响细胞培养性能的降解产物。核黄素限制和N-甲酰核素(NFK),色氨酸氧化抗原粘土素被鉴定为化学品,导致细胞培养性能降低。 (c)2015美国化学工程研究所生物科技。 Prog。,32:74-82,2016

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