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首页> 外文期刊>Acta Mechanica >Collective buckling of an elastic beam array on an elastic substrate for applications in soft lithography
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Collective buckling of an elastic beam array on an elastic substrate for applications in soft lithography

机译：弹性梁阵列在弹性基板上的集体屈曲，用于软光刻

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摘要

We analyze the collective buckling of an array of vertical elastic beams with their lower ends built into an elastic substrate. The beams interact between themselves through the deformation of the elastic substrate. The present analysis is more sophisticated than previous ones on rigid beams on an elastic substrate in that the beams are regarded as elastic rather than rigid. From the linear theory for elastic beam buckling and the linear theory of elasticity, an eigenvalue problem is formulated and solved. Calculations show that the deformability of the beams lowers the critical height of the beams, but it does not affect the buckling pattern much. Our work also suggests that the collective buckling is dominated by the interaction of neighboring beams through the deformation of the substrate rather than whether the beams are rigid or elastic. The results are useful for the better understanding, design and application of the nanostructures produced by soft lithography.
机译：我们分析了垂直弹性梁阵列的整体屈曲，其下端内置在弹性基底中。梁通过弹性基板的变形而在它们之间相互作用。在弹性基板上的刚性梁上，本分析比以前的分析更为复杂，因为梁被视为弹性梁而不是刚性梁。从弹性梁屈曲的线性理论和弹性的线性理论，提出并解决了一个特征值问题。计算表明，梁的可变形性降低了梁的临界高度，但对屈曲模式的影响不大。我们的工作还表明，集体屈曲主要是由邻近的梁通过基底的变形引起的，而不是梁是刚性的还是弹性的。结果对于更好地理解，设计和应用由软光刻产生的纳米结构是有用的。

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