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Heteroepitaxial growth of ferromagnetic MnSb(0001) films on Ge/Si(111) virtual substrates

机译:Ge / Si(111)虚拟衬底上铁磁MnSb(0001)薄膜的异质外延生长

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摘要

Molecular beam epitaxial growth of ferromagnetic MnSb(0001) has been achieved on high quality, fully relaxed Ge(111)/Si(111) virtual substrates grown by reduced pressure chemical vapor deposition. The epilayers were characterized using reflection high energy electron diffraction, synchrotron hard X-ray diffraction, X-ray photoemission spectroscopy, and magnetometry. The surface reconstructions, magnetic properties, crystalline quality, and strain relaxation behavior of the MnSb films are similar to those of MnSb grown on GaAs(111). In contrast to GaAs substrates, segregation of substrate atoms through the MnSb film does not occur, and alternative polymorphs of MnSb are absent.
机译:铁磁性MnSb(0001)的分子束外延生长已在通过减压化学气相沉积法生长的高质量,完全松弛的Ge(111)/ Si(111)虚拟衬底上实现。使用反射高能电子衍射,同步加速器硬X射线衍射,X射线光发射光谱和磁力测定法对外延层进行表征。 MnSb膜的表面重建,磁性,晶体质量和应变松弛行为与在GaAs(111)上生长的MnSb相似。与GaAs衬底相反,衬底原子不会通过MnSb膜偏析,并且不存在MnSb的其他多晶型物。

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