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首页> 外文期刊>Physica status solidi, B. Basic research >Effects of growth temperature and oxygen pressure on the properties of heteroepitaxial ZnO thin films on sapphire (0001) substrates by pulsed laser deposition
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Effects of growth temperature and oxygen pressure on the properties of heteroepitaxial ZnO thin films on sapphire (0001) substrates by pulsed laser deposition

机译:生长温度和氧气压力对蓝宝石(0001)衬底上脉冲激光沉积异质外延ZnO薄膜性能的影响

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摘要

We report a systematic study on the effect of growth temperature and O2 pressure on the structural, optical, and electrical properties of heteroepitaxial ZnO thin films prepared by pulsed laser deposition on sapphire (0001) substrates. The combination of high growth temperature and low O2 pressure was found to improve the crystalline quality of initial heteroepitaxial ZnO films, which can be attributed to the enhanced surface migration of adatoms and thermal energy. The low-temperature photoluminescence spectra from ZnO films were dominated by donor-bound exciton emission with very weak deep level emission. The temperature dependent Hall measurement showed that the films are highly degenerated, mainly due to the high defect density near the interface region.
机译:我们报告了生长温度和氧气压力对通过在蓝宝石(0001)衬底上脉冲激光沉积制备的异质外延ZnO薄膜的结构,光学和电学性质的影响的系统研究。发现高生长温度和低O2压力的组合可改善初始异质外延ZnO薄膜的晶体质量,这可归因于吸附原子的表面迁移和热能增强。 ZnO薄膜的低温光致发光光谱以供体结合的激子发射为主,深能级发射非常弱。随温度变化的霍尔测量结果表明,薄膜高度退化,主要是由于界面区域附近的缺陷密度高。

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