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首页> 外文期刊>Advanced materials interfaces >Diffusion-Mediated Growth and Size-Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates
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Diffusion-Mediated Growth and Size-Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

机译：在介电基板上的钌原子层沉积期间扩散介导的生长和大小依赖性纳米粒子反应性

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摘要

Understanding the growth mechanisms during the early stages of atomic layer deposition (ALD) is of interest for several applications including thin film deposition, catalysis, and area-selective deposition. The surface dependence and growth mechanism of (ethylbenzyl)(1-ethyl-1,4-cyclohexadienyl)ruthenium and O-2 ALD at 325 degrees C on HfO2, Al2O3, -OH, and Si-O-Si terminated SiO2, and organosilicate glass (OSG) are investigated. The experimental results show that precursor adsorption is strongly affected by the surface termination of the dielectric, and proceeds most rapidly on -OH terminated dielectrics, followed by Si-O-Si and finally Si-CH3 terminated dielectrics. The initial stages of growth are characterized by the formation and growth of Ru nanoparticles, which is mediated by the diffusion of Ru species. Mean-field and kinetic Monte Carlo modeling show that ALD on OSG is best described when accounting for (1) cyclic generation of new nanoparticles at the surface, (2) surface diffusion of both atomic species and nanoparticles, and (3) size-dependent nanoparticle reactivity. In particular, the models indicate that precursor adsorption initially occurs only on the dielectric substrate, and occurs on the Ru nanoparticles only when these reach a critical size of about 0.85 nm. This phenomenon is attributed to the catalytic decomposition of oxygen requiring a minimum Ru nanoparticle size.
机译：理解在原子层沉积（ALD）的早期阶段期间的生长机制对于包括薄膜沉积，催化和面积选择性沉积的几种应用感兴趣。 （乙基苄基）（1-乙基-1,4-环己二烯基）钌和O-2 Ald在325℃下在HfO 2，Al 2 O 3，-OH和Si-O-Si封端的SiO 2和有机硅酸盐中的表面依赖性和O-2 Ald调查玻璃（OSG）。实验结果表明，前体吸附受电介质的表面终端的强烈影响，并且在-OH封端电介质上最快地进行，然后是Si-O-Si，最后是Si-CH3封端的电介质。生长的初始阶段的特征在于Ru纳米颗粒的形成和生长，其被Ru物种的扩散介导。平均场和动力学蒙特卡罗建模表明，在核算（1）表面上的新纳米颗粒的循环产生时，ALD最佳地描述了原子物种和纳米颗粒的表面扩散，以及（3）尺寸依赖性纳米粒子反应性。特别地，模型表明前体吸附最初仅发生在介电基板上，并且仅当这些达到约0.85nm的临界尺寸时才发生在Ru纳米颗粒上。这种现象归因于需要最小ru纳米颗粒尺寸的氧的催化分解。

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