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首页> 外文期刊>ACS Macro Letters >Photopatternable Interfaces for Block Copolymer Lithography
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Photopatternable Interfaces for Block Copolymer Lithography

机译：嵌段共聚物光刻的PhotoPatternable接口

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摘要

Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block-trimethylsi- lylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential (“N2P”) or preferential to neutral (“P2N”). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.
机译：引入直接光视图集的接口，促进薄膜中的嵌段共聚物（BCP）取向的二维空间控制。 合成含有酸不稳定单体的共聚物，用光酸发生器（PAG）配制，并涂覆以产生接枝的表面处理（GST）。 这些作为铸造的GST膜固有地是中性的或优先（但不是两者）至薄片形成聚（苯乙烯 - 嵌段三甲基溶胶）（PS-B-PTMS）。 随后的接触印刷和烘焙用亚微米化学图案的光栅生产出GST。 在GST的UV暴露区域中产生的光酸的催化反应在以下两种方式之一中改变了BCP和GST之间的界面相互作用：从中性到优先（“N2P”）或优先于中性（“P2N”） 。 当PS-B-PTMS在化学图案化的GST和顶部涂层之间热退火时，形成垂直和平行BCP薄片的交替区域。

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  • 来源
    《ACS Macro Letters》 |2014年第8期|共5页
  • 作者

    Michael J. Maher; Christopher M. Bates; Gregory Blachut;

  • 作者单位

    Department of Chemistry The University of Texas at Austin Austin Texas 78712 United States;

    Department of Chemistry The University of Texas at Austin Austin Texas 78712 United States;

    McKetta Department of Chemical Engineering The University of Texas at Austin Austin Texas 78712 United States;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 有机化学;
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