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Determination of Cesium on Nickel Hexacyanoferrate-Aluminum Oxide Modified Electrodes

机译：镍六氰基甲醛氧化铝改性电极测定铯

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摘要

This report investigates the electrochemical behavior of hexacyanoferrate casted on Ni-Al2O3 modified electrodes and the preconcentration and detection of cesium ions on such films. It also studies the morphology and the composition of these surfaces. The film was grown oil a glassy carbon (GC) surface. Five consecutive voltammetric cycles applied within 0.0V and -1.6 Vat a scan rate of 10 mV/s were enough to cast the film. Scanning electron microscopy (SEM) analyses showed a homogeneous, porous but broken surface of the film. Its composition was studied by X-ray diffraction (XRD). The presence of NiHCFe was confirmed by Fourier transformed infrared spectroscopy (FT-IR). The Cs+ preconcentration from diluted solutions was accomplished in 90 s, under a negative potential of -0.20 V applied to the modified working electrode. The detection of cesium has a good sensitivity and a wide linear interval (10(-8) and 10(-12) mol L-1). Even so, the limit of detection calculated was extremely low (2 x 10(16) mol L-1), cesium concentrations lower than 10(-12) mol L-1 gave signals with no analytical significance. However, to our knowledge, this is the lowest level of cesium ever detected by an electroanalytical technique.
机译：本报告研究了己酰胺甲醛的电化学行为对Ni-Al2O3改性电极的前浓缩和检测这种薄膜的铯离子。它还研究了这些表面的形态和组成。该薄膜生长油玻璃碳（GC）表面。在0.0V和-1.6VAT内施加的五个连续伏安循环施加10mV / s的扫描速率足以铸造薄膜。扫描电子显微镜（SEM）分析显示膜的均匀多孔但断裂表面。通过X射线衍射（XRD）研究了其组合物。通过傅里叶变换的红外光谱（FT-IR）确认NiHCFE的存在。在施加到改性工作电极的-0.20V的负电位下，在90秒内完成Cs +预浓度。铯的检测具有良好的灵敏度和宽的线性间隔（10（-8）和10（-12）摩尔L-1）。即便如此，计算的检测极限非常低（2×10（16）摩尔L-1），低于10（-12）摩尔L-1的铯浓度使得没有分析意义。然而，为了我们的知识，这是通过电解理技术检测到的最低铯水平。

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