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首页> 外文期刊>Engineering Fracture Mechanics >Fracture toughness of freestanding copper films with a thickness of 39?nm
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Fracture toughness of freestanding copper films with a thickness of 39?nm

机译:独立式铜膜的骨折韧性,厚度为39Ω·纳米

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摘要

In situ field emission scanning electron microscope (FESEM) fracture toughness experiments on 39-nm-thick freestanding copper (Cu) films were conducted. We developed methods for fabricating and testing the fracture toughness of ultrathin freestanding metallic film specimens. Although 39-nm-thick Cu films showed lower critical crack tip opening displacement (CTOD) than 100–2600-nm-thick films, both films had similar critical CTODs when normalized by their film thickness. This independence of normalized CTOD on film thickness indicates that geometric similarity of local fracture morphologies exists in films with a thickness of the order of 10?nm. Crack initiation in ultrathin films was accompanied by ductile fracture.
机译:原位场发射扫描电子显微镜(FeSEM)进行39-NM厚的独立铜(Cu)膜的断裂韧性实验。 我们开发了制造和测试超薄自由型金属薄膜样本的断裂韧性的方法。 尽管39-nm厚的Cu膜显示出低于100-2600nm厚的薄膜的临界裂缝尖端开口位移(CTOD),但是当通过它们的膜厚度归一化时,两种薄膜在归一化时具有类似的关键CTOD。 这种归一化CTOD对膜厚度的这种独立性表明局部骨折形态的几何相似性存在于厚度为10Ω·Nm的薄膜中。 超薄薄膜的裂纹引发伴有延性骨折。

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