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The distribution of Ga and Sb impurities in Ge-Si crystals grown by the Bridgman method using a feeding rod

机译:用馈电棒通过布里奇曼法生长的Ge-Si晶体中Ga和Sb杂质的分布

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摘要

Gallium- and antimony-doped Ge1 - x Si (x) crystals (0 a parts per thousand currency sign x a parts per thousand currency sign 0.25) have been grown by the improved Bridgman method using a silicon seed and a macrohomogeneous feeding Ge-Si rod of the corresponding composition. The impurity concentration profiles along the grown crystals were determined from Hall measurements. The mathematical problem of impurity distribution along two-component mixed crystals grown from a melt with uniform and graded composition is solved in the Pfann approximation and within the virtual-crystal model for the solid solution. It is shown that the experimental impurity distributions in Ge1 - x Si (x) crystals are described well by the data calculated on the assumption of linear change in the impurity segregation coefficient with the crystal composition.
机译:镓和锑掺杂的Ge1-x Si(x)晶体(0千分之一货币符号xa千分之一货币符号0.25)已经通过改进的Bridgman方法,使用硅晶种和均质的Ge-Si棒生长了的相应组成。从霍尔测量确定沿生长晶体的杂质浓度分布。在Pfann逼近中和在固溶体的虚拟晶体模型中,解决了从具有均匀且渐变组成的熔体生长的沿两组分混合晶体的杂质分布的数学问题。通过在假设杂质偏析系数随晶体组成线性变化的情况下计算出的数据,可以很好地描述Ge1-x Si(x)晶体中的实验杂质分布。

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