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Toward compact and ultra-intense laser-based soft x-ray lasers

机译:朝向紧凑型和超强度激光的柔软X射线激光器

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摘要

We report here recent work on an optical field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by OFI when focusing a 1 J, 30 fs, circularly-polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d(9)4d (J = 0) -> 3d(9)4p (J = 1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs full width at half-maximum as the amplification peak rose from 150 to 1200 with an increase of the plasma density from 3 x 10(18) to 1.2 x 10(20) cm(-3). The integrated energy of the EUV laser pulse was also measured, and found to be around 2 mu J. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 2 cm), yielding EUV outputs up to 14 mu J.
机译:我们在这里报告了最近在光田电离(OFI),高阶谐波种子EUV激光器上的工作。放大介质是当将1 J,30 FS,圆极化的红外脉冲聚焦到氪的气体电池或氪气射流时由OFI获得的镍样Krypton的等离子体。激光转换是3D(9)4d(j = 0) - > 3d(9)4p(j = 1)在32.8nm处的Ni样氪离子的转变,并通过与热电子的碰撞泵浦。通过在不同延迟的高阶谐波脉冲中播种放大器来探测增益动态。由于扩增峰值从150至1200升至1200,因此增长持续时间从7gs单调下降到450 fs全宽的450 fs全宽度,随着3×10(18)到1.2 x 10的等离子体密度增加到1200(20 )cm(-3)。还测量了EUV激光脉冲的集成能量,发现是在2 mu J约约。应注意,在ASE模式下,实现了更长的放大器(最多2厘米),产生高达14亩的EUV输出j。

著录项

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  • 作者单位

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Sud 11 CNRS Lab Phys Gaz &

    Plasmas F-91405 Orsay France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    ASCR Inst Phys ELI Beamlines Project Slovance 2 Prague 18221 8 Czech Republic;

    ASCR Inst Phys ELI Beamlines Project Slovance 2 Prague 18221 8 Czech Republic;

    Univ Paris Sud 11 CNRS Lab Phys Gaz &

    Plasmas F-91405 Orsay France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    GIST Adv Photon Res Inst Gwangju 500712 South Korea;

    Ecole Polytech Lab Utilisat Lasers Intenses F-91128 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

    Univ Paris Saclay Ecole Polytech CNRS ENSTA LOA F-91762 Palaiseau France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 等离子体物理学;
  • 关键词

    XUV lasers; ultrafast laser; coherent radiation; optical field ionized plasmas;

    机译:XUV激光器;超快激光;相干辐射;光场电离等离子体;

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