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首页> 外文期刊>Journal of Mechanical Science and Technology >Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process
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Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process

机译：通过UV辅助热压印过程制造可溶性嵌段共聚物聚酰亚胺中的高纵横比微图案

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摘要

High-aspect-ratio microstructures (HARMS) of polyimides have many applications, such as components of microelectromechanical systems and X-ray gratings. This study demonstrates the fabrication of HARMS with vertical and smooth sidewalls in a thick, soluble block-copolymer polyimide (SBCP) film by an UV-assisted thermal imprint process. A preheating condition was controlled as a parameter that dominated the imprint pattern fidelity. After investigating a proper prebaking condition, patterns with a width of 3.4 mu m and a height of 35.1 mu m with a high-aspect ratio of 10 were successfully structured in an SBCP film that has a thickness of approximately a hundred micrometers. The process has potential as a low-cost fine pattern fabrication process for polyimide-based polymers.
机译：聚酰亚胺的高纵横比微结构（伤害）具有许多应用，例如微机电系统和X射线光栅的组件。 该研究通过UV辅助的热压印方法，表明用厚的可溶性嵌段 - 共聚物聚酰亚胺（SBCP）膜中的垂直和光滑的侧壁的制造。 将预热条件控制为主导压印模式保真度的参数。 在研究适当的预培养条件后，宽度为3.4μm的图案和高度为10的35.1μm，在SBCP薄膜中成功地构建了厚度约为一百微米的SBCP膜。 该方法具有作为基于聚酰亚胺聚合物的低成本精细的制造方法。

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