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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Fabrication of plasmonic TiN nanostructures by nitridation of nanoimprinted TiO2 nanoparticles
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Fabrication of plasmonic TiN nanostructures by nitridation of nanoimprinted TiO2 nanoparticles

机译：通过纳米修印纳米粒子氮化制备等离子体锡纳米结构

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Titanium nitride (TiN) is a new plasmonic material with advantages due to its greater thermal and chemical stability, compared to traditional metallic materials, i.e. gold and silver. TiN fabrication methods generally require reactive sputtering, which limits and complicates patterning capabilities. In this work, we demonstrate the fabrication of TiN films, as well as nano-patterned surfaces and three-dimensional (3D) structures by nitridation of crystalline titanium dioxide (TiO2) nanoparticle-based structures. TiO2 films are created by spin coating nanoparticle-based solutions, and TiO2 patterns are fabricated directly via solvent-assisted soft nanoimprint lithography. TiO2 films and structures were annealed in air and then reacted with ammonia gas at 1000 degrees C for 0, 2, 4, or 6 hours. SEM analysis shows that patterned TiO2 surfaces and 3D structures retain their structural integrity after treatment, allowing for a convenient method of fabricating patterned TiN nano-patterned surfaces and structures. Treated samples demonstrate the crystalline transition from tetragonal to cubic, which is consistent with the transition from anatase TiO2 to TiN. Additionally, using spectroscopic ellipsometry, we observe a change in the real permittivity from positive to negative. For 0 and 6 hour treatments, the real permittivity changes from 3.1 to -9.6 (at 1000 nm). TiN has potential use for many plasmonic and metamaterial applications. In this work, we demonstrate the excitation of surface plasmon polaritons (SPPs) via grating coupling using 1 mm-period TiN line gratings.
机译：与传统金属材料相比，氮化钛（TIN）是一种具有优点的新等离子体材料，与传统的金属材料相比，即金和银。锡制造方法通常需要反应溅射，这限制并使图案化能力变得复杂。在这项工作中，我们通过氮化二氧化钛（TiO2）纳米颗粒基结构来证明锡膜的制造，以及纳米图案化表面和三维（3D）结构。通过旋涂纳米颗粒基溶液产生TiO 2膜，通过溶剂辅助软纳米压印光刻直接制造TiO 2图案。在空气中退火TiO2薄膜和结构，然后在1000℃下与氨气反应0,2,4或6小时。 SEM分析表明，图案化的TiO2表面和3D结构在处理后保持其结构完整性，允许制造图案化的锡纳米图案化表面和结构的方便方法。处理过的样品证明了从四边形到立方的结晶转变，这与从锐钛矿TiO2转变为锡的转变。另外，使用光谱椭圆形测定法，我们观察到实际介电常数的变化从正为负。对于0和6小时的处理，实际介电常数从3.1到-9.6（1000 nm）变化。 TIN具有许多等离子体和超材料应用的潜在用途。在这项工作中，我们通过使用1 mm-indion锡线光栅来证明通过光栅耦合来展示表面等离子体极化膜（SPP）的激发。

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