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首页> 外文期刊>Journal of Materials Engineering and Performance >Effect of Deposition Pressure, Nitrogen Content and Substrate Temperature on Optical and Mechanical Behavior of Nanocomposite Al-Si-N Hard Coatings for Solar Thermal Applications
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Effect of Deposition Pressure, Nitrogen Content and Substrate Temperature on Optical and Mechanical Behavior of Nanocomposite Al-Si-N Hard Coatings for Solar Thermal Applications

机译：沉积压力，氮含量和衬底温度对太阳能热应用纳米复合Al-Si-N硬涂层光学和力学行为的影响

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摘要

Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sputtering at different process parameters. There was a significant effect of these parameters on the film properties affecting its mechanical and optical behavior. The nitrogen content or pressure, deposition pressure and substrate temperature strongly influence the phase formation which governs the hardness and optical transparency of the coating. Hardness was measured between 18 and 30GPa. The band gap could be varied in the range of 3.8-4.2eV by varying nitrogen pressures in the chamber during deposition. The films showed (0-80)% transparency in UV and visible region depending on the sputtering conditions.
机译：使用DC磁控溅射在不同的工艺参数下沉积硬质和光学透明的纳米复合膜薄膜。 这些参数对影响其机械和光学行为的膜性能存在显着影响。 氮含量或压力，沉积压力和衬底温度强烈影响涂层硬度和光学透明度的相形成。 在18至30gPa之间测量硬度。 带隙在沉积期间通过在腔室中的氮气压力变化氮气压力，可以在3.8-4.2eV的范围内变化。 根据溅射条件，薄膜在UV和可见区域中显示出（0-80）％透明度。

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