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首页> 外文期刊>Journal of Materials Engineering and Performance >Structural and Mechanical Properties of Zr-Si-N Coatings Deposited by Arc Evaporation at Different Substrate Bias Voltages
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Structural and Mechanical Properties of Zr-Si-N Coatings Deposited by Arc Evaporation at Different Substrate Bias Voltages

机译：不同衬底偏置电压下电弧蒸发沉积的Zr-Si-N涂层的结构和力学性能

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摘要

ZrN and Zr-Si-N coatings were formed using vacuum-arc plasma fluxes deposition system at the substrate bias voltage (U-B) ranged from - 50 to - 220 V on HS6-5-2 steel substrates. The structural, mechanical and tribological properties were characterized using x-ray diffraction, atomic force microscopy, scanning electron microscopy, optical microscopy, nanoindentation and ball-on-disk test. The surface roughness parameter Ra of ZrN coatings is lower than Zr-Si-N coatings. Both roughness Ra of Zr-Si-N coatings and the number of surface defects with mainly small dimensions to 1 mu m decrease with increasing negative substrate bias voltage. The addition of silicon to ZrN significantly reduces the crystallite size, from about 18.3 nm for ZrN coating to 6.4 nm for Zr-Si-N coating both deposited at the same U-B = - 100 V and 7.8 nm for U-B = - 150 V. The hardness of Zr-Si-N coatings increases to about 30 GPa with the increase in negative substrate bias voltage (U-B = - 220 V). Adhesion of the coatings tested is high, and critical load is above 80 N and reduces with U-B increase. Coefficient of friction determined using AFM shows similar trend as surface roughness in microscale.
机译：使用在HS6-5-2钢基板上的基板偏置电压（U-B）处的真空电弧等离子体熔融系统形成ZrN和Zr-Si-N涂层。使用X射线衍射，原子力显微镜，扫描电子显微镜，光学显微镜，纳米狭窄和球盘试验来表征结构，机械和摩擦学性质。 ZrN涂层的表面粗糙度参数Ra低于Zr-Si-N涂层。随着负基板偏置电压的增加，Zr-Si-n涂层的两个粗糙度Ra和主要小尺寸为1μm的缺陷的数量减小。向ZrN的加入硅的添加显着降低了ZrN涂层的约18.3nm至6.4nm的Zr-Si-n涂层，两者沉积在相同的UB = -100V和7.8nm上，对于UB = -150V。该随着负基板偏置电压（UB = - 220V）的增加，Zr-Si-N涂层的硬度增加到约30GPa。测试的涂层的粘附性高，临界负荷高于80 n，并随U-B增加减少。使用AFM测定的摩擦系数显示出与微尺度的表面粗糙度相似的趋势。

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