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首页> 外文期刊>CERAMICS INTERNATIONAL >A facile method to prepare ultra-wideband anti-reflective borosilicate glass with subwavelength structure surface
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A facile method to prepare ultra-wideband anti-reflective borosilicate glass with subwavelength structure surface

机译：一种制备具有亚波长结构表面的超宽带抗反射硼硅酸盐玻璃的容易方法

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摘要

Anti-reflective (AR) films have been widely investigated due to their various applications in optoelectronic devices. Among all the investigation, the manufacturing method is the most popular research field which directly determines the performance of anti-reflective films. Herein, Na2HPO4 and AlCl3 mixed neutral solution were used to etch the surface of K9 glass matrix to obtain the AR structure. The morphology of SEM images indicated that subwavelength structure (SWS) was formed on the glass surface via precisely controlling the solution concentration, treatment time and temperature. Owing to the porous structure, the refractive index mutation of the interface between air and glassss can be effectively weakened. Therefore, the integral transmittance, covering the whole visible light (VIS) to near-infrared (NIR) wavelength (300-2500 nm), of glass matrix was increased remarkably to 95.77%, much higher than 87.72% of blank glass, achieving the effect of ultra-wideband anti-reflection. Particularly, the transmittance at 520 nm and 1990 nm can even reach to 99.14% and 97.86%, respectively. According to the composite analysis and reaction process, Al3+ ions act as both the regulator of the solution pH and part of the new-formed glass skeleton, resulting in the more uniform and regular SWS on the glass surface. Moreover, in virtue of -OH in silanol (Si-OH) on the expanded glass surface attracting more H2O molecules or additional silylation modification on glass surface repulsing H2O molecules, the surface characteristics of AR glass with SWS films can be easily turned between hydrophilic and hydrophobic in order to meet the requirements of various application environments. These ultra-wideband AR glasses with controllable hydrophilic and hydrophobic properties are expected to be applied in many optoelectronic fields.
机译：由于它们在光电器件中的各种应用，已被广泛研究抗反射（AR）薄膜。在所有调查中，制造方法是最流行的研究领域，直接决定了抗反射膜的性能。这里，使用Na 2HPO 4和AlCl 3混合中性溶液蚀刻K9玻璃基质的表面以获得Ar结构。 SEM图像的形态表明，通过精确地控制溶液浓度，处理时间和温度，在玻璃表面上形成亚波长结构（SWS）。由于多孔结构，可以有效地减弱空气和玻璃之间的界面的折射率突变。因此，覆盖整个可见光（VI）到近红外（NIR）波长（300-2500nm）的整体透射率显着增加至95.77％，远高于87.72％的空白玻璃，实现超宽带防反射的影响。特别地，520nm和1990nm的透射率甚至可以分别达到99.14％和97.86％。根据复合分析和反应过程，Al3 +离子作为溶液pH的调节剂和新型玻璃骨架的一部分，导致玻璃表面上更均匀和规则的SWS。此外，在膨胀玻璃表面上的硅烷醇（Si-OH）在硅烷醇（Si-OH）的情况下，吸引更多H2O分子或额外的甲硅烷基化改性，或在玻璃表面排斥的H2O分子上，可以在亲水性和玻璃膜之间容易地转动Ar玻璃的表面特性。疏水性，以满足各种应用环境的要求。这些具有可控亲水性和疏水性质的超宽带AR玻璃预计将在许多光电领域应用。

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