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Determination of optical constants of thin films and multilayer stacks by use of concurrent reflectance, transmittance, and ellipsometric measurements

机译:通过同时进行反射率,透射率和椭偏测量来确定薄膜和多层堆叠的光学常数

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Using measurements of reflectance, transmittance, and the ellipsometric parameter Δ, we have determined the thickness, refractive index, and the absorption coefficient of various thin films and thin-film stacks. (Δ, the relative phase between the p- and s-polarized components, is measured for both reflected and transmitted light.) These optical measurements are performed with a specially designed system at the fixed wavelength of λ=633 nm over the 10°-75° range of angles of incidence. The examined samples, prepared by means of sputtering on fused-silica substrates, consist of monolayers and trilayers of various materials of differing thickness and optical constants. These samples, which are representative of the media of rewritable phase-change optical disks, include a dielectric mixture of ZnS and SiO_(2), an amorphous film of the Ge_(2)Sb_(2.3)Te_(5) alloy, and an aluminum chromium alloy film. To avoid complications arising from reflection and transmission losses at the air-substrate interface, the samples are immersed in an index-matching fluid that eliminates the contributions of the substrate to reflected and transmitted light. A computer program estimates the unknown parameters of the film(s) by matching the experimental data to theoretically calculated values. Although our system can be used for measurements over a broad range of wavelengths, we describe only the results obtained at λ=633 nm.
机译:使用反射率,透射率和椭偏参数Δ的测量,我们确定了各种薄膜和薄膜叠层的厚度,折射率和吸收系数。 (对于反射光和透射光,均测量p偏振分量和s偏振分量之间的相对相位。)这些光学测量是通过特殊设计的系统在λ= 633 nm的固定波长,10°- 75°入射角范围。通过溅射在熔融石英基片上制备的被检样品由厚度和光学常数不同的各种材料的单层和三层组成。这些样品代表可重写相变光盘的介质,包括ZnS和SiO_(2)的电介质混合物,Ge_(2)Sb_(2.3)Te_(5)合金的非晶膜以及铝铬合金膜。为了避免由于空气与基材界面处的反射和透射损失而引起的复杂性,将样品浸入折射率匹配的液体中,该液体消除了基材对反射和透射光的影响。计算机程序通过将实验数据与理论上计算出的值进行匹配来估计胶片的未知参数。尽管我们的系统可以用于很宽的波长范围内的测量,但我们仅描述了在λ= 633 nm处获得的结果。

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