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Variation of band-edge position with errors in the monitoring of layer termination level for longand short-wave pass filters

机译:带边位置的变化,在长波和短波通滤波器的层终端电平监视中存在误差

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摘要

Optical monitoring of periodic thin-film stacks by the termination 'of each layer at the same constant photometric level has certain advantages. One of these principal advantages is the error compensation effect in the vicinity of the monitoring wavelength. In this study, we examine, by simulation, the effect of an error in the knowledge of the absolute value of the photometric termination level on the probable stability in the manufacture of the edge position of a blocked band. The results include equations that allow the determination of the appropriate values of parameters associated with the optimum termination levels to minimize the effects of such errors.
机译:通过以相同的恒定光度级终止每一层来对周期性薄膜堆叠进行光学监视具有某些优点。这些主要优点之一是在监视波长附近的误差补偿效果。在这项研究中,我们通过仿真检查了光度终止水平的绝对值知识中的误差对制造阻带边缘位置的可能稳定性的影响。结果包括等式,这些等式允许确定与最佳端接级别相关的参数的适当值,以最小化此类错误的影响。

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