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首页> 外文期刊>Infrared physics and technology >Thorium free antireflection coating in MWIR region on Silicon optics
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Thorium free antireflection coating in MWIR region on Silicon optics

机译：硅光学公司MWIR区域的无减反射涂层

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摘要

Most infrared transmitting optics have high refractive indices which in turn have high per surface reflection loss. So antireflection coating has very important role in increasing the transmission in the desired wavelength region. In this paper a study has been carried out on the design and fabrication of Thorium free antireflection coating effective for Silicon substrate in MWIR (3.6-4.9 μm) region. The wave band 3.6-4.9 μm is chosen for the reported work because the detected system used in MWIR region has a band selection filter effective in the same wavelength region. Comprehensive search method was used to design the multilayer stack on Silicon substrate. The coating materials used in the design were Germanium (Ge) and Silicon dioxide (SiO _2). The fabrication of coating was made in a coating plant fitted with Cryo pump system and Residual Gas Analyzer. The evaporation was carried out at high vacuum (2-6 × 10-6 mbar) using Electron Beam Gun and layer thicknesses were measured with crystal monitor. The result achieved for the antireflection coating was 96% average transmission in 3.6-4.9 μm band which withstood MIL-F-48616 environmental testing. This work provides an alternate antireflection coating on Silicon by replacing radioactive Thorium Fluoride, used as a coating material in most IR antireflection coating designs.
机译：大多数红外透射光学器件具有高折射率，这又具有高的单位表面反射损耗。因此抗反射涂层在增加所需波长区域的透射率方面具有非常重要的作用。在本文中，已经进行了有效的无Thor抗反射涂层的设计和制造研究，该无for抗反射涂层可有效用于MWIR（3.6-4.9μm）区域的硅基板。选择3.6-4.9μm波段进行报告工作，因为在MWIR区域中使用的检测系统具有在相同波长区域内有效的波段选择滤波器。综合搜索法被用于设计硅衬底上的多层堆叠。设计中使用的涂层材料是锗（Ge）和二氧化硅（SiO _2）。涂层的制造是在配有低温泵系统和残留气体分析仪的涂层工厂中进行的。使用电子束枪在高真空（2-6×10-6 mbar）下进行蒸发，并使用晶体监测仪测量层厚。抗反射涂层的结果是在3.6-4.9μm的波段中平均透射率达到96％，这可以经受住MIL-F-48616环境测试。这项工作通过替代放射性的氟化Thor（在大多数红外减反射涂层设计中用作涂层材料），在硅上提供了另一种减反射涂层。

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