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首页> 外文期刊>Integrated Ferroelectrics >COMPOSITIONALLY GRADED Ba_(1-x)Sr_xTiO_3 FERROELECTRIC THIN FILMS LAYER-BY-LAYER DEPOSITED BY PULSED LASER ABALATION
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COMPOSITIONALLY GRADED Ba_(1-x)Sr_xTiO_3 FERROELECTRIC THIN FILMS LAYER-BY-LAYER DEPOSITED BY PULSED LASER ABALATION

机译：脉冲激光烧蚀逐层沉积Ba_（1-x）Sr_xTiO_3铁电薄膜的组成

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摘要

Compositionally graded (Ba_(1-x)Sr_x)TiO_3 (BST) (x: 0.0 approx 0.25) thin films were layer-by-layer grown on Pt(111)/Ti/SiO_2/Si(100) substrates by pulsed laser ablation at oxygen pressures between 50 approx 400 mTorr. The influence of ambient gas pressure on the film preferred orientation and dielectric properties of graded films were systematically investigated. For up-graded films with Ba/Sr ratios varying from 75/25 at the substrate to 100/0 at the top surface, the preferred orientation evolved in the sequences of (100)+(110)->(110)+(111)->(100) as increasing the ambient gas pressure, whereas for the down-graded films with Ba/Sr ratios varying from 100/0 at the substrate to 75/25 at the top surface, the preferred orientation varied in the order of (100)+(110)->(100). The related driving force for orientation evolution was presumably changed from minimization of surface energy to minimization of energy loss per unit area as increasing ambient gas pressure An enhanced dielectric behavior was observed in the down-graded films, which may be mainly attributed to the large strain fields built in the down-graded films and at the down-graded film/substrate interface.
机译：通过脉冲激光烧蚀在Pt（111）/ Ti / SiO_2 / Si（100）衬底上逐层生长组成渐变（Ba_（1-x）Sr_x）TiO_3（BST）（x：0.0约0.25）薄膜在50到400 mTorr之间的氧气压力下。系统地研究了环境气压对梯度梯度薄膜的优选取向和介电性能的影响。对于Ba / Sr比从基材的75/25到顶表面的100/0的升级膜，优选的取向按（100）+（110）->（110）+（111）的顺序演变）->（100）随环境气压的增加而增加，而对于Ba / Sr比从衬底的100/0到顶表面的75/25变化的降级膜，优选的取向按以下顺序变化（100）+（110）->（100）。随着环境气压的增加，取向演化的相关驱动力可能从最小化表面能变为最小化每单位面积的能量损失。在降级膜中观察到增强的介电性能，这可能主要归因于大应变在降级的胶片和降级的胶片/基材界面中建立的场。

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