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New optical near-field nanolithography with optical fiber probe laser irradiating atomic force microscopy probe tip

机译:光纤探针激光辐照原子力显微镜探针的新型光学近场纳米光刻技术

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摘要

A new optical near-field nanolithography scheme with optical fiber probe laser irradiating atomic force microscopy (AFM) probe tip is proposed. Through optical theoretical analysis, if the metallic AFM probe tip is in the evanescent field of optical fiber probe tip, the secondary near-field enhancement effect can appear underneath the metallic AFM probe tip. Based on the independently developed AFM system and optical system, the nanolithography platform is built and nanocraters structures can be successfully created, which demonstrates that the new scheme is an effective and promising nanolithography approach for the future nanoelectronics, nanobiotechnology, nanowelding, etc.
机译:提出了一种采用光纤探针激光辐照原子力显微镜(AFM)探针尖端的近场纳米光刻新方案。通过光学理论分析,如果金属AFM探针尖端位于光纤探针尖端的the逝场中,则次级近场增强效果可能会出现在金属AFM探针尖端下方。在独立开发的AFM系统和光学系统的基础上,构建了纳米光刻平台并可以成功创建纳米坑结构,这表明该新方案对于未来的纳米电子学,纳米生物技术,纳米焊接等是一种有效且有前途的纳米光刻方法。

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