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首页> 外文期刊>International Journal of Refractory Metals & Hard Materials >The effects of electro-deposition current parameters on performance of tungsten coating
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The effects of electro-deposition current parameters on performance of tungsten coating

机译：电沉积电流参数对钨涂层性能的影响

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摘要

Tungsten coatings prepared on heat sink materials (Al_2O_3-Cu) as PFC not only can release amount of impinging thermal power but also can resist erosion under plasma particles bombardment in the ITER reactor. Therefore electro-deposition technique using for obtaining tungsten coating on Al_2O_3-Cu substrate was a novel technique especially for fusion applications. In this paper, pure tungsten coatings were successfully deposited under various pulsed current densities at 1173 K in Na_2WO_4-WO_3 melts. Furthermore pulse current density, duty cycle and period were investigated respectively so as to obtain well defined structures for tungsten coatings. The composition, crystal structure and microstructure of tungsten coatings were characterized by XPS, SEM and XRD techniques. The results indicated that pulsed current density, duty cycle and period have significant influence on tungsten nucleation and electro-crystallization phenomena.
机译：在散热器材料（Al_2O_3-Cu）上以PFC形式制备的钨涂层不仅可以释放出一定量的撞击热能，而且还可以抵抗ITER反应堆中等离子体轰击下的腐蚀。因此，用于在Al_2O_3-Cu衬底上获得钨涂层的电沉积技术是一种新技术，特别是在熔融应用中。本文成功地在Na_2WO_4-WO_3熔体中在1173 K下以各种脉冲电流密度成功沉积了纯钨涂层。此外，分别研究了脉冲电流密度，占空比和周期，以便获得钨涂层的明确定义的结构。用XPS，SEM和XRD技术对钨涂层的组成，晶体结构和微观结构进行了表征。结果表明，脉冲电流密度，占空比和周期对钨成核和电结晶现象有显着影响。

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