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Phase-field simulation of long-wavelength line edge roughness in diblock copolymer resists~a

机译：二嵌段共聚物抗蚀剂〜a中长波长线边缘粗糙度的相场模拟

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摘要

We examine stochastic computer simulations of the Leibler-Ohta-Kawasaki (LOK) phase-field model~([1,2]) and demonstrate that long-wavelength line edge roughness (LER) and line width roughness (LWR) in a lamellar diblock copolymer resist depend monotonically on quench depth and noise strength, and that the LER and LWR spectra both exhibit a peak at k_0-the characteristic wavenumber of mesophase separation in diblock copolymers. For k k_0, we find that the LER spectrum approximately scales like k ~(-16). These observations are consistent with previous theoretical, computational, and experimental examinations LER and LWR in diblock copolymer melts, and thus the LOK phase-field model should be considered a capable and appropriate framework for future examination of long-wavelength LER and LWR in block copolymer resist systems.
机译：我们研究了Leibler-Ohta-Kawasaki（LOK）相场模型〜（[1,2]）的随机计算机模拟，并证明了在片状二嵌段中的长波长线边缘粗糙度（LER）和线宽粗糙度（LWR）共聚物抗蚀剂单调依赖于淬火深度和噪声强度，并且LER和LWR谱都在k_0处出现一个峰，这是二嵌段共聚物中相分离的特征波数。对于k k_0，我们发现LER谱大约按k〜（-16）缩放。这些观察结果与以前的理论，计算和实验检查均与二嵌段共聚物熔体中的LER和LWR一致，因此应将LOK相场模型视为将来检查嵌段共聚物中长波长LER和LWR的有力且适当的框架抵抗系统。

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