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High temperature oxidation of high purity nickel: oxide scale morphology and growth kinetics

机译：高纯度镍的高温氧化：氧化皮形态和生长动力学

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摘要

The oxidation of high purity nickel was studied between 600 and 1200 deg C for scale thickness between 1 and 30 mum. At or above 1100 deg C, the scale growth kinetics are strictly parabolic. The scales are then compact with columnar and facetted NiO grains. A more complex behaviour is observed below 1000 deg C: (i) for test temperatures between 1000 and 800 deg C, mass gain curves cannot he fitted to a parabola, (ii) different scale morphologies and microstructures are observed depending on scale thickness and temperature (iii) a duplex scale is formed below 800 deg C. In addition to the possible effect of grain-boundary diffusion, the departure of growth kinetics from simple pure parabolic kinetics could be also related to the complex scale microstructure and its large evolution during scale growth. In situ oxidation of nickel specimens in an environmental SEM equipped with a hot stage specimen holder permitted to follow the morphological evolution of NiO scales. In situ grown NiO scales show the same microstructural features as observed on Ni specimens oxidised for longer duration in pure oxygen at atmospheric pressure.
机译：研究了在600至1200摄氏度之间氧化皮的高纯镍，氧化皮厚度在1至30微米之间。在1100摄氏度或以上时，水垢的生长动力学严格是抛物线形的。然后将鳞片用圆柱状和刻面的NiO颗粒压实。在1000摄氏度以下观察到更复杂的行为：（i）在1000到800摄氏度之间的测试温度下，质量增益曲线无法拟合到抛物线，（ii）根据标尺厚度和温度观察到不同的标度形态和微观结构（iii）在800摄氏度以下形成双相氧化皮。除了晶界扩散的可能影响外，生长动力学与简单的纯抛物线动力学的偏离也可能与复杂的氧化皮微观结构及其在氧化皮中的大演化有关。增长。在配有热台标架的环境SEM中，镍标本的原位氧化可以追踪NiO鳞片的形态演变。原位生长的NiO氧化皮显示出与在大气压下在纯氧中长时间氧化的Ni样品相同的微观结构特征。

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