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首页> 外文期刊>Microwave and optical technology letters >AN IMPROVED SUBSTRATE-LOSS MODEL TO DETERMINE MOSFET DRAIN, SOURCE AND SUBSTRATE ELEMENTS
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AN IMPROVED SUBSTRATE-LOSS MODEL TO DETERMINE MOSFET DRAIN, SOURCE AND SUBSTRATE ELEMENTS

机译:用于确定MOSFET漏极,源极和衬底元素的改进的衬底损耗模型

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摘要

An improved model to account for the substrate-loss effects in RF-MOSFETs, which includes its associated parameter extraction, is presented in this paper. This model considers the source-to-bulk capacitance, which allows the proper modeling of MOSFETs output admittance at high frequencies, thus obtaining an excellent agreement between simulated and experimental data up to 21 GHz The proposed model also allows the determination of the source and drain resistances at a given gate bias, independent of frequency.
机译:本文提出了一种改进的模型来解决RF-MOSFET中的衬底损耗效应,包括相关的参数提取。该模型考虑了源到体电容,从而可以对MOSFET的高频输出导纳进行正确建模,从而在高达21 GHz的仿真数据和实验数据之间取得了很好的一致性。该模型还可以确定源极和漏极给定栅极偏置下的电阻,与频率无关。

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