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Common path two-wavelength homodyne counting interferometer development

机译:共通两波长零差计数干涉仪的研制

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The linearity of displacement measurement is an important parameter in nanometrology. The development of the common path two-wavelength (633 nm and 532 nm) homodyne counting interferometer within the Nanotrace project is described. These two differential interferometers are also designed for the elimination of optical path drifts and fluctuations. Their short-term instability is projected to be in the order of tens of pm in the single wavelength path difference and below 10 pm in the difference of these two wavelength path differences. This solution enables better real-time validation of interferometer fringe interpolation. The whole system could be transportable and measure displacements up to 100 (mu)m under ambient air conditions under cover. Refractive index compensation will also be included.
机译:位移测量的线性度是纳米计量学中的重要参数。描述了在Nanotrace项目中共同路径两波长(633 nm和532 nm)零差计数干涉仪的发展。这两个差分干涉仪还设计用于消除光路漂移和波动。预计它们的短期不稳定性在单个波长路径差中为几十pm左右,而在这两个波长路径差中为10 pm以下。该解决方案可以更好地实时验证干涉仪条纹插值。整个系统可以运输,并且在盖下的环境空气条件下可以测量高达100μm的位移。折射率补偿也将包括在内。

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