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The structural properties of GaN insertions in GaN/A1N nanocolumn heterostructures

机译:GaN / AlN纳米柱异质结构中GaN插入物的结构特性

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摘要

The strain state of 1 and 2.5 nm thick GaN insertions in GaN/AIN nanocolumn heterostructures has been studied by means of a combination of high resolution transmission electron microscopy, Raman spectroscopy and theoretical modeling. It is found that 2.5 nm thick GaN insertions are partially relaxed, which has been attributed to the presence of dislocations in the external AIN capping layer, in close relationship with the morphology of GaN insertions and with the A1N capping mechanism. The observed plastic relaxation in A1N is consistent with the small critical thickness expected for GaN/A1N radial heterostructures.
机译:通过结合高分辨率透射电子显微镜,拉曼光谱和理论建模,研究了GaN / AIN纳米柱异质结构中1和2.5 nm厚GaN插入层的应变状态。发现2.5 nm厚的GaN插入被部分松弛,这归因于外部AIN覆盖层中存在位错,这与GaN插入的形态以及AlN覆盖机制密切相关。在AlN中观察到的塑性弛豫与GaN / AlN径向异质结构所期望的小临界厚度一致。

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