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Argon plasma etching of gallium nitride: spectroscopic surprises

机译:氮化镓的氩等离子体刻蚀:光谱学上的惊喜

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摘要

It is shown that bulk MOVPE-grown GaN can exhibit dramatically increased near-band-edge and below-bandgap emission after argon plasma etching. The temperature dependence of the near-band-edge emission shows that donor-bound excitons are the dominant species in Ar-etched samples while free excitons dominate spectra from unetched samples. Under UV illumination and a low temperatures metastable behaviour is apparent from the defect-related blue and yellow luminescence bands. The clear linkage between the yellow and blue emission bands indicates that any microscopic model of the defect(s) associated with the yellow luminescence must also be able to explain the blue luminescence. At room temperature, UV illumination over a period of time enhances the yellow emission by a factor of 20 and it is shown that this effect can be employed for room-temperature optical data storage and retrieval.
机译:结果表明,在氩等离子体刻蚀之后,块状MOVPE生长的GaN可以显着提高近带边发射和带隙以下发射。近带边缘发射的温度依赖性表明,在Ar腐蚀样品中,供体结合的激子是主要物质,而自由激子则占未腐蚀样品的光谱。在紫外线照射和低温下,从与缺陷相关的蓝色和黄色发光带可以明显看出亚稳态行为。黄色和蓝色发射带之间的清晰联系表明,任何与黄色发光相关的缺陷的微观模型也必须能够解释蓝色发光。在室温下,一段时间内的紫外线照射会使发黄光增强20倍,并且表明该效果可用于室温光学数据的存储和检索。

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