Ordered arrays of silicon pillars with controlled height and aspect ratio

Sinitskii A; Neumeier S; Nelles J; Fischler M; Simon U

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Ordered arrays of silicon pillars with controlled height and aspect ratio

机译：具有受控的高度和纵横比的有序硅柱阵列

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We report the fabrication of ordered arrays of silicon pillars via a combination of nanosphere lithography (NSL) and reactive ion etching (RIE). For NSL we used monolayers of silica particles self-assembled onto silicon substrates as masks for the deposition of hexagonal arrays of chromium nanoislands. By changing the amount of the deposited metal we fabricated arrays of nanoislands with different size and spacing. By using these arrays as masks for RIE, silicon pillars with different height (up to 1100 nm) and aspect ratio (up to 12:1) could be obtained.

机译：我们报告通过结合纳米球光刻（NSL）和反应离子刻蚀（RIE）来制造有序的硅柱阵列。对于NSL，我们使用自组装在硅衬底上的二氧化硅颗粒单层作为掩模，以沉积六方铬纳米岛阵列。通过改变沉积金属的数量，我们制造了具有不同尺寸和间距的纳米岛阵列。通过将这些阵列用作RIE的掩模，可以获得具有不同高度（最大1100 nm）和纵横比（最大12：1）的硅柱。

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《Nanotechnology》 |2007年第30期|共6页
作者
Sinitskii A; Neumeier S; Nelles J; Fischler M; Simon U;
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正文语种 eng
中图分类一般工业技术;
关键词
NANOSPHERE LITHOGRAPHY; NANOPILLAR ARRAYS; POROUS SILICON; FABRICATION; SIZE; NANOWIRES; NANOCRYSTALS; PARTICLES; SURFACES; RANGE;

机译：纳米岩相照相;纳米柱阵列;多孔硅;制造;尺寸;纳米线;纳米晶;颗粒;表面;范围;

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1. Ordered arrays of silicon pillars with controlled height and aspect ratio [J] . Sinitskii A, Neumeier S, Nelles J, Nanotechnology . 2007,第30期

机译：具有受控的高度和纵横比的有序硅柱阵列
2. Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (> 50 : 1) silicon pillar arrays by nanoimprint and etching [J] . Morton KJ, Nieberg G, Bai SF, Nanotechnology . 2008,第34期

机译：通过纳米压印和蚀刻，对直径小于40 nm的晶圆尺寸图形和高纵横比（> 50：1）的硅柱阵列
3. Height/width aspect ratio controllable two-dimensional sub-micron arrays fabricated with two-photon photopolymerization [J] . Jia BH, Gan XS, Gu M Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic . 2004,第8期

机译：利用双光子光聚合制备的高度/宽度纵横比可控的二维亚微米阵列
4. NUMERICAL INVESTIGATION OF THE PRESSURE DROP THROUGH MICRO-PILLAR ARRAYS FOR A WIDE RANGE OF ASPECT RATIOS [C] . Ahmed M. Taher, Benjamin Jones, Ihab G. Adam, ASME international mechanical engineering congress and exposition . 2014

机译：宽比例比范围内通过微柱阵列进行压降的数值研究
5. AN ADAPTIVE CONTROL SCHEME WHICH OPTIMIZES THE OPERATION OF A PROPOSED MINING SYSTEM WITH APPLICATIONS TO SHORTWALL, LONGWALL, AND ROOM AND PILLAR MINING SYSTEMS [D] . DORNETTO, LOUIS DOMINIC. 1980

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6. Electrolytic Manganese Dioxide Coatings on High Aspect Ratio Micro-Pillar Arrays for 3D Thin Film Lithium Ion Batteries [O] . Yafa Zargouni, Stella Deheryan, Alex Radisic, 2017

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7. 6:1 aspect ratio silicon pillar based thermal neutron detector filled with \u3csup\u3e10\u3c/sup\u3eB [O] . Nikolic, R. J., Conway, A. M., Reinhart, C. E., 2008

机译：6：1长宽比基于硅柱的热中子探测器充满了\ u3csup \ u3e10 \ u3c / sup \ u3eB
8. Study on Locally Confined Deposition of Si Nanocrystals in High-Aspect- Ratio Si Nano-Pillar Array for Nano-Electronic and Nano-Photonic Applications [R] . Kuo, H. 2010

机译：用于纳米电子和纳米光子应用的高纵横比si纳米柱阵列局部受限沉积si纳米晶的研究

Ordered arrays of silicon pillars with controlled height and aspect ratio

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