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Arrays of Ge islands on Si(001) grown by means of electron-beam pre-patterning

机译:通过电子束预构图在Si(001)上生长的Ge岛阵列

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We show that well-defined arrays of self-assembled Ge dots on Si(001) can be grown after pre-patterning the Si surface by means of an electron beam. The electron beam produces C-containing growth masks. The overgrowth of these masks with Si results in pits at the Si surface, in and around which Ge dots nucleate selectively. A manifold of different arrays can be obtained. Almost perfect arrays of quadruples of dots nucleate in the intersections of the four {11n} facets. This way of producing quantum dot arrays is very promising for producing dot structures suitable for use in the study of, for instance, dot-dot tunnelling and related effects.
机译:我们表明,在通过电子束对硅表面进行预构图后,可以在Si(001)上生长自定义的Ge点的定义明确的阵列。电子束产生含C的生长掩模。这些掩模中的Si过度生长会在Si表面产生凹坑,Ge点及其周围会选择性地成核。可以获得不同阵列的流形。在四个{11n}面的交点中,几乎四倍的点的完美阵列成核。产生量子点阵列的这种方式对于产生适合用于例如点-点隧穿和相关效应的研究的点结构是非常有前途的。

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