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Raman determination of uniformity of multilayer Si/Ge structures with Ge quantum dots

机译:用锗量子点拉曼测定多层Si / Ge结构的均匀性

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摘要

Spectra of Raman scattering by optical phonons of multilayer Si/Ge structures with Ge quantum dots (QDs) grown by means of low-temperature (T_s = 250 °C) molecular beam epitaxy are studied. Two types of Ge islands are observed: pseudomorphic to a Si matrix, and those in which the strains are relaxed non-uniformly. Application of polarization measurements allows us to separate the phonon lines corresponding to these two components of a QD array. A method for the quantitative estimation of the degree of uniformity of the QD array, determining the integrated electron-hole spectrum of the structure, is proposed.
机译:研究了通过低温(T_s = 250°C)分子束外延生长的具有Ge量子点(QDs)的多层Si / Ge结构的光子对拉曼散射的光谱。观察到两种类型的Ge岛:对Si矩阵是伪晶的,以及应变不均匀松弛的Ge岛。极化测量的应用使我们能够分离与QD阵列的这两个分量相对应的声子线。提出了一种定量估计量子点阵列均匀度,确定结构的电子空穴谱的方法。

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