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Direct synthesis of single-crystalline silicon nanowires using molten gallium and silane plasma

机译:使用熔融镓和硅烷等离子体直接合成单晶硅纳米线

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We report the first ever demonstration of using silane directly in the gas phase and molten gallium in a microwave plasma for bulk nucleation and growth of single-crystal quality silicon nanowires. Multiple nanowires nucleated and grew from micron- to millimetre-sized gallium droplets. The resulting nanowires were tens to hundreds of nanometres in diameter and were tens to hundreds of microns long. Transmission electron microscopy results confirmed the nanowires to be single crystalline, devoid of structural defects, and grown along the <100> direction. The as-synthesized silicon nanowires were sheathed with an ultrathin (<1 nm) non-uniform native oxide amorphous layer that could be directly used in the assembly of electronic and optoelectronic devices.
机译:我们报道了有史以来首次证明直接在气相中使用硅烷和在微波等离子体中使用熔融镓用于单晶质量硅纳米线的整体成核和生长。多个纳米线成核并从微米级的镓液滴生长到毫米级。所得纳米线的直径为数十至数百纳米,并且长度为数十至数百微米。透射电子显微镜结果证实纳米线是单晶的,没有结构缺陷,并且沿着<100>方向生长。合成后的硅纳米线被超薄(<1 nm)非均匀自然氧化物非晶层包覆,该层可直接用于电子和光电设备的组装中。

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