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首页> 外文期刊>Nanotechnology >Fabrication of hemispherical cavity arrays on silicon substrates using laser-assisted nanoimprinting of self-assembled particles
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Fabrication of hemispherical cavity arrays on silicon substrates using laser-assisted nanoimprinting of self-assembled particles

机译：使用自组装粒子的激光辅助纳米压印在硅基板上制备半球形空腔阵列

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摘要

A new approach to fabricating hemispherical cavity arrays on silicon (Si) substrate using laser-assisted nanoimprinting of self-assembled particles is presented. A monolayer of silica particles, with different diameters of 0.30 and 0.97 mum, was deposited on a Si substrate by self-assembly. A quartz plate was tightly placed on the sample surface to firmly sandwich the self-assembled nanoparticle monolayer. The silica particles were imprinted into Si substrates after laser irradiation (KrF excimer laser, lambda = 248 nm) on the quartzanoparticle/Si structure with a single pulse. Ultrasonic cleaning and hydrofluoric acid (HF) solution were used to remove the silica particles in the sample surface. Hemispherical cavities were formed on the substrate surface. The influence of laser fluence and particle size on the structuring of the surface has been investigated. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were performed to observe the dimensions of the cavities. One-dimensional thermal calculation was employed to calculate the thermal effects in this process.
机译：提出了一种利用自组装粒子的激光辅助纳米压印技术在硅（Si）衬底上制造半球形空腔阵列的新方法。通过自组装将具有0.30和0.97μm的不同直径的二氧化硅颗粒的单层沉积在Si衬底上。将石英板紧密地放置在样品表面上，以将自组装的纳米颗粒单层牢固地夹在中间。激光辐照（KrF受激准分子激光，λ= 248 nm）后，用一个脉冲将二氧化硅颗粒压印在Si / Si衬底上。超声清洗和氢氟酸（HF）溶液用于去除样品表面的二氧化硅颗粒。在基板表面上形成半球形空腔。研究了激光通量和粒径对表面结构的影响。进行扫描电子显微镜（SEM）和原子力显微镜（AFM）以观察腔的尺寸。使用一维热计算来计算此过程中的热效应。

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