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Microstructure and photoluminescence spectra of porous InP

机译:多孔InP的微观结构和光致发光光谱

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摘要

Photoluminescence (PL) of porous InP formed by electrochemical etching techniques is measured at room temperature. Compared to the PL of the bulk InP wafer, a blueshifted PL emission is observed. It is found that the amount of the blueshifted energy depends on the microstructure of porous InP, which in turn strongly depends on the potential voltage applied during the electrochemical etching. Time-resolved PL study of the sample shows that surface nonradiative recombination is dominant.
机译:在室温下测量通过电化学蚀刻技术形成的多孔InP的光致发光(PL)。与块状InP晶片的PL相比,观察到蓝移的PL发射。发现蓝移能量的量取决于多孔InP的微观结构,而多孔InP的微观结构又强烈取决于在电化学蚀刻期间施加的电势电压。样品的时间分辨PL研究表明表面非辐射复合是主要的。

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