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Biaxially textured Mo films with diverse morphologies by substrate-flipping rotation

机译：通过衬底翻转旋转形成具有多种形态的双轴织构Mo膜

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摘要

A class of nanostructured Mo thin films was grown by DC magnetron sputtering using a robust substrate rotation mode called 'flipping rotation'. In this rotation mode, the substrate is arranged to rotate continuously at a fixed speed around an axis lying within and parallel to the substrate. The incident flux is perpendicular to the rotational axis, and the incident flux angle changes continuously. Mo nanostructured films, grown under different rotation speeds with three orders of magnitude spread (ranging from 0.008 to 24rotationmin~(-1)), different flipping directions (clockwise and counter-clockwise), and different ending deposition angles, were characterized using scanning electron microscopy (SEM) and reflection high energy electron diffraction (RHEED) surface-pole-figure techniques. Despite their very different morphologies, such as 'C'-shaped, 'S'-shaped, and vertically aligned nanorods, the same biaxial texture with an average out-of-plane dispersion of ～ 15°° was observed. In contrast, we showed that only a fiber-textured Mo film was obtained by using the conventional rotation mode where the oblique incident flux angle was fixed with the substrate rotating around the surface normal.
机译：一类纳米结构化的Mo薄膜是通过DC磁控管溅射技术，使用一种称为“翻转旋转”的坚固基板旋转模式生长的。在该旋转模式下，基板被布置为以固定速度围绕位于基板内并与基板平行的轴连续旋转。入射磁通量垂直于旋转轴，并且入射磁通量角连续变化。利用扫描电子对Mo纳米结构薄膜进行了表征，该薄膜在不同的转速下以三个数量级的扩散（范围为0.008至24rotationmin〜（-1）），不同的翻转方向（顺时针和逆时针）以及不同的最终沉积角度生长。显微镜（SEM）和反射高能电子衍射（RHEED）表面极图技术。尽管它们的形态非常不同，例如“ C”形，“ S”形和垂直排列的纳米棒，但观察到相同的双轴织构，平均面外分散度约为15°°。相反，我们表明，通过使用传统的旋转模式只能获得纤维化的Mo膜，其中倾斜入射通量角是固定的，而基板围绕表面法线旋转。

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