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A novel liquid thermal polymerization resist for nanoimprint lithography with low shrinkage and high flowability

机译：低收缩，高流动性的新型纳米压印液态热聚合抗蚀剂

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摘要

A novel liquid thermal polymerization resist was prepared for nanoimprint lithography on flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylate (MMA), n-butylacrylate (n-BA), methacrylic acid (MAA) and 2,2'-azobisisobutyronitrile (AIBN). The resist can be imprinted at room temperature with a pressure of 1.2 MPa, and then cured at 95 deg C to obtain nano-scaled and micro-scaled patterns. Replications of high-density line and space patterns with resolutions of 50 and 100 nm were obtained on a flexible ITO/PET substrate. The liquid resist has low viscosity, and shows a near-zero residual layer at the bottom of the pattern. Due to the addition of PMMA as the binder, the shrinkage of the resist after curing is only 2.01 percent.
机译：制备了一种新型的液态热聚合抗蚀剂，用于在柔性塑料基板上进行纳米压印光刻。该抗蚀剂是聚（甲基丙烯酸甲酯）（PMMA），甲基丙烯酸甲酯（MMA），丙烯酸正丁酯（n-BA），甲基丙烯酸（MAA）和2,2'-偶氮二异丁腈（AIBN）的混合物。可以在室温下以1.2 MPa的压力压印该抗蚀剂，然后在95摄氏度下固化以获得纳米级和微米级的图案。在柔性ITO / PET基板上获得了分辨率为50和100 nm的高密度线和空间图案的复制品。液体抗蚀剂具有低粘度，并且在图案的底部显示接近零的残留层。由于添加了PMMA作为粘合剂，固化后抗蚀剂的收缩率仅为2.01％。

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