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Controlled co-evaporation of silanes for nanoimprint stamps

机译：用于纳米压印图章的硅烷的受控共蒸发

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A new chemical vapour deposition setup for the generation of anti-adhesive coatings on Si stamps used in nanoimprint lithography has been developed. This is suitable for controlled co-evaporation of more than one type of silane by directly injecting a premixed silane into an evacuated deposition reactor through a septum. This process was found to be very flexible and resulted in reproducible coatings. A surface coated with a mixture of mono- and trichlorosilanes shows a higher water contact angle than those of individual coatings, which is attributed to the interaction between the two types of silane molecules. In addition, the influence of process parameters, e.g. water content, temperature and number of imprints, on the coating quality will be discussed.
机译：已经开发出一种新的化学气相沉积装置，用于在纳米压印光刻中使用的Si压模上生成防粘涂层。通过将预混合的硅烷通过隔垫直接注入排空的沉积反应器中，这适用于控制不止一种以上类型的硅烷的共蒸发。发现该方法非常灵活并且产生可再现的涂层。用一氯硅烷和三氯硅烷的混合物涂覆的表面显示的水接触角比单个涂层的水接触角高，这归因于两种类型的硅烷分子之间的相互作用。此外，工艺参数的影响，例如含水量，温度和压印数量，将讨论涂层质量。

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