Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO_2/ indium tin oxide-coated glass substrates

Jost W Lessi; Clarence Tang; Pierre-Andre Knenzi

首页> 外文期刊>Nanotechnology >Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO_2/ indium tin oxide-coated glass substrates

【24h】

Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO_2/ indium tin oxide-coated glass substrates

机译：纳米级选择性分子组装构图：通过电子束光刻在SiO_2 /氧化铟锡涂层玻璃基板上产生蛋白质图案的新型平台

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.

机译：通过电子束光刻在绝缘基板上形成几何形状明确的亚微米结构受到表面电荷的阻碍。当试图通过在透明玻璃基板上进行选择性分子组装图案（SMAP）创建纳米尺寸的蛋白质图案时，此问题变得至关重要。在本文中，我们证明了使用导电铟锡氧化物薄膜可以解决电子束写入过程中的表面电荷问题，同时与用于表面改性的标准SMAP协议兼容。

著录项

来源
《Nanotechnology》 |2005年第9期|共6页
作者
Jost W Lessi; Clarence Tang; Pierre-Andre Knenzi;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类一般工业技术;
关键词

相似文献

外文文献
专利

1. Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO_2/ indium tin oxide-coated glass substrates [J] . Jost W Lessi, Clarence Tang, Pierre-Andre Knenzi Nanotechnology . 2005,第9期

机译：纳米级选择性分子组装构图：通过电子束光刻在SiO_2 /氧化铟锡涂层玻璃基板上产生蛋白质图案的新型平台
2. A novel approach to produce biologically relevant chemical patterns at the nanometer scale: Selective molecular assembly patterning combined with colloidal lithography [J] . Michel R., Reviakine I., Sutherland D., Langmuir: The ACS Journal of Surfaces and Colloids . 2002,第22期

机译：一种产生纳米级生物学相关化学图案的新方法：选择性分子组装图案结合胶体光刻
3. Anisotropy of selective epitaxy in nanoscale-patterned growth: GaAs nanowires selectively grown on a SiO_2-patterned (001) substrate by molecular-beam epitaxy [J] . S. C. Lee, L. R. Dawson, S. R. J. Brueck, Journal of Applied Physics . 2005,第11期

机译：纳米尺度生长中选择性外延的各向异性：通过分子束外延选择性生长在SiO_2图案（001）衬底上的GaAs纳米线
4. Nanoscale protein patterning on Si substrates using colloidal lithography and plasma processing [C] . A.Malainou, K.Ellinas, P.S. Petrou Anniversary Eurosensors Conference . 2013

机译：纳米级蛋白质在Si基板上用胶体光刻和等离子体加工进行图案化
5. Nanoscale protein patterning by electric lithography and electric printing lithography. [D] . Chang, Yu. 2007

机译：通过电光刻和电印刷光刻进行纳米级蛋白质图案化。
6. Trehalose Glycopolymer Resists Allow Direct Writing of Protein Patterns by Electron-Beam Lithography [O] . Erhan Bat, Juneyoung Lee, Uland Y. Lau, -1

机译：海藻糖糖醇抗性可通过电子束光刻直接写入蛋白质图案
7. Nanoscale Protein Patterning on Si Substrates using Colloidal Lithography and Plasma Processing [O] . Malainou A., Ellinas K., Petrou P.S., 2011

机译：使用胶体光刻和等离子处理技术在硅基板上进行纳米级蛋白质构图

Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO_2/ indium tin oxide-coated glass substrates

摘要

著录项

相似文献

相关主题

期刊订阅