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Raman study of self-assembled SiGe nanoislands grown at low temperatures

机译:在低温下生长的自组装SiGe纳米岛的拉曼研究

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摘要

We report on Raman scattering measurements on Si-capped Ge quantum structures grown by molecular beam epitaxy on Si(001) at low temperatures. We find a double band structure in the Ge-Ge frequency range for nanoislands grown at substrate temperatures ranging in the interval 300-500 deg C. Complementary information has been obtained from performing Raman scattering experiments on annealed samples. The results are interpreted in terms of a model that considers quantum structures (hut clusters) composed of a strained Ge core and a more relaxed SiGe shell.
机译:我们报告了在低温下通过Si(001)上的分子束外延生长的Si盖的Ge量子结构上的拉曼散射测量。我们发现,在衬底温度介于300-500摄氏度之间的情况下生长的纳米岛的Ge-Ge频率范围内存在双带结构。通过对退火样品进行拉曼散射实验已获得了补充信息。根据考虑了由应变Ge核和更弛豫的SiGe壳组成的量子结构(小屋簇)的模型来解释结果。

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